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Characterization of the rf plasma jet sputtering system by optical emission spectroscopy
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
1993 (English)Conference paper, Published paper (Refereed)
Place, publisher, year, edition, pages
1993. Vol. 4(2.6), 1272-1277 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-258493OAI: oai:DiVA.org:uu-258493DiVA: diva2:841759
Conference
11th International symposium on plasma chemistry, Loughborough, England
Available from: 2015-07-14 Created: 2015-07-14 Last updated: 2015-07-14

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CiteExportLink to record
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Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
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