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Reactive deposition of diamond and Si carbide films by hydrogen plasma etching of graphite and Si in rf plasma jet
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
1993 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 223, 218-222 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1993. Vol. 223, 218-222 p.
National Category
Engineering and Technology
URN: urn:nbn:se:uu:diva-258494OAI: oai:DiVA.org:uu-258494DiVA: diva2:841762
Available from: 2015-07-14 Created: 2015-07-14 Last updated: 2015-07-14

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