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Process simulation of substrate dependent resputtering effects during the initial phases of ion assisted thin film deposition
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
1994 (English)Conference paper (Refereed)
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Engineering and Technology
URN: urn:nbn:se:uu:diva-258593OAI: oai:DiVA.org:uu-258593DiVA: diva2:841982
4th Euoprean Vacuum Conference, Uppsala
Available from: 2015-07-16 Created: 2015-07-16 Last updated: 2015-07-16

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