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Silicon surface damage caused by reactive ion etching in fluorocarbon gas mixtures containing hydrogen
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1991 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 9, no 1, 34-40 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1991. Vol. 9, no 1, 34-40 p.
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Engineering and Technology
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URN: urn:nbn:se:uu:diva-258661OAI: oai:DiVA.org:uu-258661DiVA: diva2:842212
Available from: 2015-07-17 Created: 2015-07-17 Last updated: 2017-12-04

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