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A new high rate sputter erosion principle applied to multipurpose thin film processing
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1992 (English)Conference paper, Published paper (Refereed)
Place, publisher, year, edition, pages
1992.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-258678OAI: oai:DiVA.org:uu-258678DiVA: diva2:842248
Conference
15th Nord semiconductor meeting, Finland
Available from: 2015-07-17 Created: 2015-07-17 Last updated: 2015-07-17

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CiteExportLink to record
Permanent link

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Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf