Controlling the profile of high aspect ratio gratings in diamond
2016 (English)In: Diamond and related materials, ISSN 0925-9635, E-ISSN 1879-0062, Vol. 63, 60-68 p.Article in journal (Refereed) Published
Diamond is an excellent material for infrared optics and for applications in harsh environments. Some of those desirable properties, i.e. hardness and chemical inertness, also make it a challenging material to machine and etch. In this study we have tested a wide range of etch parameters in an inductively coupled plasma etcher, in order to produce highly controlled, high aspect ratio gratings in diamond. We discuss the effects of pressure, bias power, and some gas mixture variation (pure oxygen and argon-oxygen) on the etch results and how it im- pacts the etch mask sputtering and redeposition. We also present a method for applying a fresh aluminum mask, in order to etch even deeper optical grating. Gratings with aspect ratios as high as 1:13.5 have been achieved with a 1.42 μm grating period.
Place, publisher, year, edition, pages
2016. Vol. 63, 60-68 p.
Grating; Reactive ion etching; Synthetic diamond; Sputtering
Manufacturing, Surface and Joining Technology Engineering and Technology
Research subject Engineering Science with specialization in Materials Science
IdentifiersURN: urn:nbn:se:uu:diva-260214DOI: 10.1016/j.diamond.2015.08.007ISI: 000371942700012OAI: oai:DiVA.org:uu-260214DiVA: diva2:846699
9th International Conference on New Diamond and Nano Carbons (NDNC)