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Assessing kinetics of surface adsorption-desorption of gas molecules via electrical measurements
Fudan Univ, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China..
Fudan Univ, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China..
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Fudan Univ, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China..
2016 (English)In: Sensors and actuators. B, Chemical, ISSN 0925-4005, E-ISSN 1873-3077, Vol. 223, 791-798 p.Article in journal (Refereed) Published
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Text
Abstract [en]

Gas sensing represents a grand research and application field. Owing to their unique structure of single-atom/molecule thickness, the emerging two-dimensional (2D) semiconductors are anticipated to display ultrahigh sensitivity capable of detecting minute changes in surface charge. To support the vast variety of gas sensing applications for domestic gases and environmental control, rapid and reliable quantitative analysis of measurement results based on established sensing mechanism and kinetics is essential. The present work uses graphene-based 2D sensors as a model system to establish the analytical capability for assessing the adsorption-desorption kinetics of gas molecules via electrical characterization. By linking the electrical current in graphene to the surface coverage of gas molecules and by incorporating the non-steady-state initial conditions for adsorption and desorption, an analytical model is established. Important kinetic parameters including activation energy, equilibrium coverage and adsorption-desorption time constants are obtained. The model can also facilitate real-world applications in gas sensing.

Place, publisher, year, edition, pages
2016. Vol. 223, 791-798 p.
Keyword [en]
Analytical model, Surface adsorption-desorption, Electrical measurement, Sensitivity metrics, Graphene
National Category
Analytical Chemistry Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-274263DOI: 10.1016/j.snb.2015.10.019ISI: 000366458700104OAI: oai:DiVA.org:uu-274263DiVA: diva2:900154
Funder
Swedish Research Council, 621-2014-5591
Available from: 2016-02-03 Created: 2016-01-20 Last updated: 2017-11-30Bibliographically approved

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Zhang, Shi-Li

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