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Spatial and chemical patterning of hyaluronic acid using UV lithography
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Microsystems Technology.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Microsystems Technology.
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2016 (English)Conference paper, Poster (with or without abstract) (Refereed)
Place, publisher, year, edition, pages
2016.
National Category
Engineering and Technology
Research subject
Engineering Science with specialization in Microsystems Technology
Identifiers
URN: urn:nbn:se:uu:diva-284623OAI: oai:DiVA.org:uu-284623DiVA: diva2:920734
Conference
Micronano System Workshop (MSW 2016), Lund, Sweden, May 17-18 2016
Available from: 2016-04-19 Created: 2016-04-19 Last updated: 2016-11-02Bibliographically approved

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Sjögren, FridaPorras, Ana MariaTenje, Maria

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Sjögren, FridaPorras, Ana MariaTenje, Maria
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