uu.seUppsala University Publications
Change search
ReferencesLink to record
Permanent link

Direct link
Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
2016 (English)Conference paper (Refereed)Text
Abstract [en]

Reactive sputtering is a popular process to deposit oxides, nitrides, and several other compounds. Unfortunately, this process mostly exhibits a hysteresis effect. The hysteresis causes a delicate choice of either a high deposition rate but not a fully oxidized/nitrided film or a fully formed compound film but at a significantly lower deposition rate. For high reactivity target material/reactive gas systems, the hysteresis forces the process to flip quite abrupt between these two conditions. Process control may therefore be quite critical. In this work we will use the original "Berg model" as well as the newly published "upgraded Berg model" to illustrate how hysteresis is generated. We have selected one simple graph (reactive gas flow vs. partial pressure) that gives clear indications of how the process may be affected in such a way as to decrease or even eliminate the hysteresis. Specific values of target size and composition, gas mixture as well as total pressure and pumping speed are processing parameters that may be selected in a way to eliminate hysteresis. We will show that this behavior is predicted by the simulations and also refer to experimental evidence for such behavior.

Place, publisher, year, edition, pages
2016. Vol. 290, 34-38 p.
Keyword [en]
Reactive sputtering, Hysteresis, Modeling, Thin film
National Category
Materials Engineering
Identifiers
URN: urn:nbn:se:uu:diva-297548DOI: 10.1016/j.surfcoat.2016.02.029ISI: 000374370600007OAI: oai:DiVA.org:uu-297548DiVA: diva2:942985
Conference
58th Annual Technical Conference of the Society-of-Vacuum-Coaters (SVC), APR 25-30, 2015, Santa Clara, CA
Available from: 2016-06-27 Created: 2016-06-23 Last updated: 2016-08-30Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full text

Search in DiVA

By author/editor
Särhammar, ErikNyberg, TomasBerg, Sören
By organisation
Solid State Electronics
Materials Engineering

Search outside of DiVA

GoogleGoogle Scholar
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

Altmetric score

Total: 61 hits
ReferencesLink to record
Permanent link

Direct link