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The effect of substrate temperature on the structure and hardness of magnetron sputtering deposited carbon nitride films
Uppsala University.
Uppsala University.
Uppsala University.
Uppsala University.
1999 (English)In: PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, ISSN 0031-8965, Vol. 172, no 2, 373-378 p.Article in journal (Other scientific) Published
Abstract [en]

Carbon nitride films are deposited on Si(001) substrates by reactive de magnetron sputtering graphite in a pure N-2 discharge. The structure of carbon nitride films was probed using near edge X-ray absorption fine structure (NEXAFS) and high resolution el

Place, publisher, year, edition, pages
WILEY-V C H VERLAG GMBH , 1999. Vol. 172, no 2, 373-378 p.
Keyword [en]
THIN-FILMS; MICROSTRUCTURE; SUPERHARD; CNX
Identifiers
URN: urn:nbn:se:uu:diva-67347OAI: oai:DiVA.org:uu-67347DiVA: diva2:95258
Note
Addresses: Zheng WT, Jilin Univ, Dept Mat Sci, Changchun 130023, Peoples R China. Jilin Univ, Dept Mat Sci, Changchun 130023, Peoples R China. Uppsala Univ, Dept Phys, S-57121 Uppsala, Sweden. Linkoping Univ, Dept Phys, S-58183 Linkoping, Sweden.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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