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Analytical TEM characterization of the interfacial layer between ALD Hf02 film and silicon substrate
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry.
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2005 (English)In: Journal of Crystal Growth, no 273, 510-514 p.Article in journal (Refereed) Published
Abstract [en]

High-resolution transmission electron microscopy and electron energy loss spectrometry were used to characterize

the interfacial layer formed between the silicon substrate and the HfO2 thin film grown by atomic layer deposition (ALD) from HfIU4 and O2. The interfacial layer was amorphous and contained SiO2 mixed with a small amount of elemental Si on the atomic level. The interfacial silicon oxide layer was mainly deposited at the beginning of the ALD process since its thickness was insensitive to the number of applied ALD cycles when increased from 50 to 1000.

Place, publisher, year, edition, pages
2005. no 273, 510-514 p.
Keyword [en]
Electron energy loss spectroscopy, Atomic layer deposition, HfO2, Silicon oxide
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-67639OAI: oai:DiVA.org:uu-67639DiVA: diva2:95550
Available from: 2004-12-22 Created: 2004-12-22 Last updated: 2011-01-12

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Lu, JunHårsta, AndersCarlsson, Jan-Otto

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Inorganic Chemistry

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