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LOW-PRESSURE CVD OF TUNGSTEN CARBIDES
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
1995 (English)In: Journal de Physique IV, Vol. 5, no c5, 967-974 p.Article in journal (Refereed) Published
Abstract [en]

Tungsten carbide films have been deposited by CVD from a WF6/C3H8/H-2 gas mixture on several different substrate materials (Ta, Si, SiC and C). Single-phase WC films could easily be obtained on Ta substrates at 900 degrees C using a total pressure of 100

Place, publisher, year, edition, pages
1995. Vol. 5, no c5, 967-974 p.
Keyword [en]
DEPOSITION; KINETICS; FILMS
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-68598OAI: oai:DiVA.org:uu-68598DiVA: diva2:96509
Note
Addresses: UNIV UPPSALA, DEPT INORGAN IC CHEM, BOX 538, S-75121 UPPSALA, SWEDEN.Available from: 2006-12-14 Created: 2006-12-14 Last updated: 2011-01-16

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Jansson, UlfCarlsson, Jan-Otto

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