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CHEMICAL-VAPOR-DEPOSITION OF AL2O3 ON TIO
Uppsala University.
Uppsala University.
1995 (English)In: THIN SOLID FILMS, Vol. 263, no 1, 28-36 p.Other (Other scientific)
Abstract [en]

This paper is a study of the phase content and morphology of Al2O3 grown by the AlCl3/H-2/CO2 process on a chemical vapour deposition (CVD) TiO layer. The results were compared with the results of CVD of Al2O3 on Ti2O3, Ti3O5 and TiO2 from an earlier inv

Place, publisher, year, pages
ELSEVIER SCIENCE SA LAUSANNE , 1995. Vol. 263, no 1, 28-36 p.
Keyword [en]
ALUMINUM OXIDE; CHEMICAL VAPOR DEPOSITION; COATINGS; TITANIUM OXIDE; TITANIUM-OXIDES; ALUMINUM-OXIDE; COATINGS; ALCL3-H2-CO2; KAPPA-AL2O3; DIFFRACTION; ALPHA-AL2O3; NUCLEATION; SYSTEM; GROWTH
Identifiers
URN: urn:nbn:se:uu:diva-68743OAI: oai:DiVA.org:uu-68743DiVA: diva2:96654
Note
Addresses: FREDRIKSSON E, UNIV UPPSALA, INST CHEM, THIN FILM & SURFACE CHEM GRP, BOX 531, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17

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