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INITIAL-STAGES OF GROWTH DURING CVD OF W ON TISI2 SUBSTRATES
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
1995 (English)In: Thin Solid Films, Vol. 263, no 1, p. 54-64Article in journal (Refereed) Published
Abstract [en]

The initial stages of growth in chemical vapour deposition (CVD) of W from WF6 have been studied in an ultra-high vacuum system using CVD TiSi2 films as substrates. The influence of different surface conditions on the substrate-reduction process was inve
Place, publisher, year, edition, pages
1995. Vol. 263, no 1, p. 54-64
Keywords [en]
CHEMICAL VAPOR DEPOSITION; METALLIZATION; TUNGSTEN; X-RAY PHOTOELECTRON SPECTROSCOPY; CHEMICAL-VAPOR-DEPOSITION; X-RAY PHOTOELECTRON; SELECTIVE TUNGSTEN; ELECTRONIC-STRUCTURE; HYDROXYL-GROUPS; SILICON; OXIDATION; SURFACE; XPS; SPECTROSCOPY
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-68753OAI: oai:DiVA.org:uu-68753DiVA, id: diva2:96664
Note
Addresses: ENGQVIST J, UNIV UPPSALA, DEPT INORGANIC CHEM, BOX 538, S-75121 UPPSALA, SWEDEN.Available from: 2006-12-14 Created: 2006-12-14 Last updated: 2011-01-16

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Jansson, Ulf

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