uu.seUppsala University Publications
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
CHEMICAL-VAPOR-DEPOSITION OF CU2O ON MGO(100) FROM CUI AND N2O - ASPECTS OF EPITAXY
Uppsala University.
Uppsala University.
Uppsala University.
1995 (English)In: JOURNAL OF CRYSTAL GROWTH, Vol. 151, no 3-4, 305-311 p.Other (Other scientific)
Abstract [en]

Cu2O thin films were grown by chemical vapour deposition (CVD) from CuI and N2O on MgO(100) substrates. The orientation of the films was strongly influenced by the substrate pre-treatment. For films deposited at 650 degrees C several epitaxial orientatio

Place, publisher, year, pages
ELSEVIER SCIENCE BV , 1995. Vol. 151, no 3-4, 305-311 p.
Keyword [en]
THIN-FILMS; MGO; GROWTH; MORPHOLOGY
Identifiers
URN: urn:nbn:se:uu:diva-68835OAI: oai:DiVA.org:uu-68835DiVA: diva2:96746
Note
Addresses: OTTOSSON M, UNIV UPPSALA, DEPT INORGAN CHEM, THIN FILM & SURFACE CHEM GRP, BOX 531, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17

Open Access in DiVA

No full text

By organisation
Uppsala University

Search outside of DiVA

GoogleGoogle Scholar

urn-nbn

Altmetric score

urn-nbn
Total: 285 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf