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CRYSTALLINITY, MORPHOLOGY AND MICROSTRUCTURE OF CHEMICAL-VAPOR-DEPOSITED CARBON-FILMS ON DIFFERENT SUBSTRATES
Uppsala University.
Uppsala University.
1995 (English)In: THIN SOLID FILMS, Vol. 261, no 1-2, 52-58 p.Other (Other scientific)
Abstract [en]

Carbon films have been deposited by chemical vapor deposition from C2H4 at 900 degrees C on various substrates. Film characterization with respect to crystallinity, morphology and surface microstructure was performed by X-ray diffraction, Auger electron

Place, publisher, year, pages
ELSEVIER SCIENCE SA LAUSANNE , 1995. Vol. 261, no 1-2, 52-58 p.
Keyword [en]
AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; GRAPHITE; PYROLYTIC CARBON; NICKEL; METHANE; CO; KINETICS
Identifiers
URN: urn:nbn:se:uu:diva-68928OAI: oai:DiVA.org:uu-68928DiVA: diva2:96839
Note
Addresses: JOHANSSON AS, UNIV UPPSALA, INST CHEM, THIN FILM & SURFACE CHEM GRP, BOX 531, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17

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