LASER-CHEMICAL ETCHING OF CU2O
1995 (English)In: APPLIED SURFACE SCIENCE, ISSN 0169-4332, Vol. 86, no 1-4, 543-547 p.Article in journal (Other scientific) Published
Thin films of highly oriented Cu2O on single crystalline MgO (100) substrates were etched by a focused Ar+ laser operated at 458 nm. Two different etch gases, Cl-2 and SOCl2, were used. The etch rate was examined as a function of temperature and total pr
Place, publisher, year, edition, pages
ELSEVIER SCIENCE BV , 1995. Vol. 86, no 1-4, 543-547 p.
IdentifiersURN: urn:nbn:se:uu:diva-69060OAI: oai:DiVA.org:uu-69060DiVA: diva2:96971
Addresses: STENBERG G, UNIV UPPSALA, DEPT ORGAN CHEM, THIN FILM & SURFACE CHEM GRP, BOX 531, S-75121 UPPSALA, SWEDEN.2008-10-172008-10-172011-01-16