uu.seUppsala University Publications
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
LASER-CHEMICAL ETCHING OF CU2O
Uppsala University.
Uppsala University.
Uppsala University.
Uppsala University.
1995 (English)In: APPLIED SURFACE SCIENCE, ISSN 0169-4332, Vol. 86, no 1-4, 543-547 p.Article in journal (Other scientific) Published
Abstract [en]

Thin films of highly oriented Cu2O on single crystalline MgO (100) substrates were etched by a focused Ar+ laser operated at 458 nm. Two different etch gases, Cl-2 and SOCl2, were used. The etch rate was examined as a function of temperature and total pr

Place, publisher, year, edition, pages
ELSEVIER SCIENCE BV , 1995. Vol. 86, no 1-4, 543-547 p.
Identifiers
URN: urn:nbn:se:uu:diva-69060OAI: oai:DiVA.org:uu-69060DiVA: diva2:96971
Note
Addresses: STENBERG G, UNIV UPPSALA, DEPT ORGAN CHEM, THIN FILM & SURFACE CHEM GRP, BOX 531, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-16

Open Access in DiVA

No full text

By organisation
Uppsala University

Search outside of DiVA

GoogleGoogle Scholar

urn-nbn

Altmetric score

urn-nbn
Total: 309 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf