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Self-aligned silicides for Ohmic contacts in CMOS technology: TiSi2, CoSi2 and NiSi
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Physics, Department of Physics and Materials Science, Materials Science.
2004 (English)In: J. Vac. Sci. Tech., Vol. A22, no 4, 1361-1370 p.Article in journal (Refereed) Published
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2004. Vol. A22, no 4, 1361-1370 p.
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URN: urn:nbn:se:uu:diva-69591OAI: oai:DiVA.org:uu-69591DiVA: diva2:97502
Available from: 2005-04-06 Created: 2005-04-06 Last updated: 2011-01-12

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