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Influence of a Si layer intercalated between Si0.75Ge0.25 and Ni on the behavior of the resulting NiSi1-uGeu film
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Physics, Department of Physics and Materials Science, Materials Science.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Physics, Department of Physics and Materials Science, Materials Science.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Physics, Department of Physics and Materials Science, Materials Science.
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2004 (English)In: Journal on Applied Physics, Vol. 96, 7179-7182 p.Article in journal (Refereed) Published
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2004. Vol. 96, 7179-7182 p.
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URN: urn:nbn:se:uu:diva-69904OAI: oai:DiVA.org:uu-69904DiVA: diva2:97815
Available from: 2007-01-25 Created: 2007-01-25 Last updated: 2011-01-12

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Jarmar, TobiasEricson, FredricSmith, Ulf

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