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Chemical vapour deposition of tungsten carbides on tantalum and nickel substrates
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
1996 (English)In: Thin Solid Films, Vol. 272, no 1, 116-123 p.Article in journal (Refereed) Published
Abstract [en]

Tungsten carbide films have been deposited by low-pressure chemical vapour deposition from a WF6/H-C3(8)/H-2 mixture on Ta and Ni substrates. Single-phase WC films could be deposited on Ta in a broad vapour composition range at 900 degrees C. A mixture o

Place, publisher, year, edition, pages
1996. Vol. 272, no 1, 116-123 p.
Keyword [en]
nickel; tungsten; tantalum; KINETICS; CARBON; FILMS; CVD
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-69981OAI: oai:DiVA.org:uu-69981DiVA: diva2:97892
Note
Addresses: UNIV UPPSALA, DEPT INORGANIC CHEM, BOX 538, S-75121 UPPSALA, SWEDEN.Available from: 2006-12-14 Created: 2006-12-14 Last updated: 2011-01-15

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