Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films
1998 (English)In: APPLIED PHYSICS LETTERS, ISSN 0003-6951, Vol. 72, no 25, 3353-3355 p.Article in journal (Other scientific) Published
Fluorinated amorphous carbon (a-CFx) films were studied by high-resolution x-ray absorption, emission, and photoelectron spectroscopy. The composition and local bonding information were obtained and correlated with substrate temperature during deposition.
Place, publisher, year, edition, pages
AMER INST PHYSICS , 1998. Vol. 72, no 25, 3353-3355 p.
IdentifiersURN: urn:nbn:se:uu:diva-70667OAI: oai:DiVA.org:uu-70667DiVA: diva2:98578
Addresses: Ma YJ, Sharp Microelect Technol Inc, 5700 NW Pacific Rim Blvd, Camas, WA 98607 USA. Sharp Microelect Technol Inc, Camas, WA 98607 USA. Uppsala Univ, Dept Phys, Uppsala, Sweden.2008-10-172008-10-172011-01-14