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Model relating process variables to film electrical properties for reactively sputtered tantalum oxide thin films
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2003 (English)In: J Appl Phys, Vol. 93, 3596-3604 p.Article in journal (Refereed) Published
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2003. Vol. 93, 3596-3604 p.
URN: urn:nbn:se:uu:diva-71269OAI: oai:DiVA.org:uu-71269DiVA: diva2:99180
Available from: 2007-02-22 Created: 2007-02-22 Last updated: 2011-01-13

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Berg, Sören
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Department of Engineering SciencesElectronics

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