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Anomalous diffraction effect on the surface core-level photoemission from Si(001)2x1-Cs surface
Uppsala University.
Uppsala University.
Uppsala University.
Uppsala University.
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1998 (English)In: JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, ISSN 0368-2048, Vol. 88, 539-543 p.Article in journal (Other scientific) Published
Abstract [en]

The angular dependence of the Si 2p photoelectron intensity has been measured for a Cs-saturated Si(001)2 x 1 surface. A surface Si 2p component, which is attributed to the Si-dimer underneath the Cs overlayer, shows a large intensity variation as a funct

Place, publisher, year, edition, pages
ELSEVIER SCIENCE BV , 1998. Vol. 88, 539-543 p.
Keyword [en]
photoelectron diffraction; photoemission intensity; surface core-level shifts; layer attenuation model; PHOTOELECTRON DIFFRACTION; ELECTRONIC-STRUCTURES; DOUBLE-LAYER; SPECTROSCOPY; ADSORPTION; COVERAGE; DIMERS; STATES; 2X1; SI
Identifiers
URN: urn:nbn:se:uu:diva-71333OAI: oai:DiVA.org:uu-71333DiVA: diva2:99244
Note
Addresses: Abukawa T, Tohoku Univ, Sci Measurements Res Inst, Sendai, Miyagi 98077, Japan. Tohoku Univ, Sci Measurements Res Inst, Sendai, Miyagi 98077, Japan. Univ Dortmund, D-44221 Dortmund, Germany. Univ Lausanne, Inst Phys Expt, CH-1015 Lausanne, SwitAvailable from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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