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High rate reactive de magnetron sputter deposition of Al2O3 films
Uppsala University.
Uppsala University.
Uppsala University.
Uppsala University.
1998 (English)In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, ISSN 0734-2101, Vol. 16, no 2, 639-643 p.Article in journal (Other scientific) Published
Abstract [en]

Aluminum oxide films were produced by reactive de magnetron sputtering of Al in Ar+O-2. The composition of the films was characterized by Rutherford backscattering measurements. Stoichiometric films possessed excellent optical properties with a refractive

Place, publisher, year, edition, pages
AMER INST PHYSICS , 1998. Vol. 16, no 2, 639-643 p.
Keyword [en]
OPTICAL-PROPERTIES; DC; COATINGS
Identifiers
URN: urn:nbn:se:uu:diva-71583OAI: oai:DiVA.org:uu-71583DiVA: diva2:99494
Note
Addresses: Olsson MK, Univ Uppsala, Dept Mat Sci, POB 534, S-75121 Uppsala, Sweden. Univ Uppsala, Dept Mat Sci, S-75121 Uppsala, Sweden. Linkoping Univ, Dept Phys, S-58183 Linkoping, Sweden. Univ Uppsala, Dept Phys, S-75121 Uppsala, Sweden.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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