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  • 1.
    Barankova, H
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, L
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    High-rate hot hollow cathode arc deposition of chromium and chromium nitride films2004In: Surf Coat Technol, Vol. 188-189, p. 703-707Article in journal (Refereed)
  • 2.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Atmospheric Plasma Technology for Coating2007In: 50 Years of Vacuum Coating Technology and the Growth of the Society of Vacuum Coaters / [ed] Donald M. Mattox and Vivienne Harwood Mattox, Society of Vacuum Coaters, Albuquerque, NM , 2007, , p. Chap. 19p. 141-146Chapter in book (Other academic)
  • 3.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Cold atmospheric plasma sources2002In: INVITED PAPER, ANZIO 2002, 5th Symp.Europ.Vac.Coaters, September 30, Rome-Anzio, Italy, abstract only, 2002Conference paper (Refereed)
  • 4.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Cold atmospheric plasma sources based on hollow cathodes2002In: INVITED presentation at 1st Topical Meeting on Pulsed and Atmospheric Pressure Plasma Processing, FMT - Forschungszentrum für Mikrostrukturtechnik, Univestity of Wuppertal, Wuppertal, March 2002, 2002Conference paper (Refereed)
  • 5.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Cold Atmospheric Plasma Sources for Surface Treatment2003In: The 46th Annual Tech Conf of the Society of acuum Coaters (SVC), San Francisco, May 2003, Invited talk P-1, 2003, p. 427-430Conference paper (Refereed)
  • 6.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Comparison of pulsed dc and rf hollow cathode depositions of Cr and CrN films2011In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 205, no 17-18, p. 4169-4176Article in journal (Refereed)
    Abstract [en]

    A cylindrical chromium hollow cathode powered by a pulsed dc generator working in a constant power mode was used for PVD of chromium and chromium nitride films on silicon substrates in argon and nitrogen plasmas, respectively. A comparison of the pulsed dc process with the radio frequency hollow cathode depositions of Cr and CrN films at identical power levels shows considerable differences particularly in the deposition rate of Cr films. At the pulsed power above 250 W the hot cathode/diffuse arc regimes were reached with the cathode outlet temperature as high as 1300 degrees C and the maximum deposition rates of both Cr and CrN films exceeded 1 mu m/min. The resulting film properties, e.g. the microstructure and morphology were studied and compared with the films obtained by the rf hollow cathode PVD.

  • 7.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of gas and cathode material on the r.f. hollow cathode reactive PVD1999In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 121, p. 704-708Article in journal (Refereed)
    Abstract [en]

    The process of generation of the radio frequency (r.f.) hollow cathode discharge was examined for different gases and different materials of the r.f. electrode. The delivered r.f. power range used in the experiments enabled analysis of the hollow cathode

  • 8.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of magnetic field configuration on the performance of hollow cathode linear arc discharge (LAD) source1998In: Int.Conf.Metall.Coat.&Thin Films - ICMCTF-98, San Diego, Paper G.3-7, 1998Conference paper (Refereed)
  • 9.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of the gas and cathode material on the rf hollow cathode performance1998In: Paper at The 193rd Meet.of the Elecctrochem. Soc., San Diego, May, Ext.abstract 203. Proc. Vol. 98-1.The Electrochem. Soc., Inc, 1998, p. 203-Conference paper (Refereed)
  • 10.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Fused hollow cathode cold atmospheric plasma2000In: Appl Phys Letters, Vol. 76, no 3, p. 285-287Article in journal (Refereed)
  • 11.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Fused hollow cathode cold atmospheric plasma cource for gas treatment2002In: Catalysis Today, Vol. 72, p. 237-241Article in journal (Refereed)
  • 12.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Fused hollow cathode cold atmospheric plasma in monoatomic and molecular gases2002In: Symposium on Cold atmospheric Plasma Technologies, 202nd Meeting of The Electrochemical Society, Salt Lake City, October, abstract No. 458, 2002Conference paper (Refereed)
  • 13.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Fused hollow cathode cold atmospheric plasma source2001In: 1st Symposium on Cold atmospheric Plasma Technologies, The Electrochemical Society Spring Meeting, Washington, 2001Conference paper (Refereed)
  • 14.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    High Density Plasma PVD of CrN Films2004In: 6th Symp European Vacuum Coaters, September 2004, Rome-Anzio, Italy, 2004, p. Invited paper-Conference paper (Other scientific)
  • 15.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Hollow Cathode and Hybrid Atmospheric Plasma Sources2007In: Proceedings of the: PLENARY PAPER, 2007Conference paper (Refereed)
  • 16.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow Cathode and Hybride Plasma Processing2005In: Proc of the 8th Int Symp on Sputtering & Plasma Processes (ISSP 2005), Kanazawa, Japan, June, PP1-3, 2005, p. p. 234-238Conference paper (Other scientific)
  • 17.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow Cathode and Hybride Plasma Processing2006In: Vacuum 80 (2006) 688-692., p. 688-692Article in journal (Refereed)
  • 18.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow cathode atmospheric pressure plasma sources for surface treatment2003In: Surface and Coatings Technology, Vol. 174-175, p. 63-67Article in journal (Refereed)
  • 19.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow cathode atmospheric pressure plasma sources for surface treatment2002In: , 8th International Conference on Plasma Surfaced Engineering - PSE 2002, Garmisch-Partenkirchen, September, Keynote lecture K8, 2002Conference paper (Refereed)
  • 20.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow cathode cold atmospheric plasma sources with monoatomic and molecular gases2003In: Surf Coat Technol, Vol. 163-164, p. 649-653Article in journal (Refereed)
  • 21.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow cathode cold atmospheric plasma sources with monoatomic and molecular gases2002In: Int.Conf.Metall.Coat.&Thin Films - ICMCTF-02, April, San Diego, 2002Conference paper (Refereed)
  • 22.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow Cathode Plasma Cleaning and Surface Activation2002In: Vacuum & Coating Technology NovemberArticle in journal (Refereed)
  • 23.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow Cathode Plasma Cleaning and Surface Activation2002In: Proceedings of the 45th Annual Tech.Conf. of the Society of Vacuum Coaters (SVC), Orlando, April 2002, www.svc.org., Proc, 2002, p. 109-112Conference paper (Refereed)
  • 24.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillstånndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillstånndets elektronik.
    Hollow cathode plasma sources for large area surface treatment2001In: Invited paper at Int.Conf.Metall.Coat.&Thin Films - ICMCTF-01, San Diego, 2001Conference paper (Refereed)
  • 25.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow cathode plasma sources for large area surface treatment2001In: Surf Coat Technol, Vol. 146-147, p. 486-490Article in journal (Refereed)
  • 26.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    New hybrid source of cold atmospheric plasma2004In: Surface and Coatings Technology, Vol. 177-178, p. 688-692Article in journal (Refereed)
  • 27.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    New hybrid source of cold atmospheric plasma2003In: ICMCTF´03, San Diego, April, 2003Conference paper (Refereed)
  • 28.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    New Plasma Sources for PE CVD2003In: Invited paper, 1st Int Symposium on Design and Technology of Coatings, Bonassola, Italy September 24-26, Proc ed by E Olzi and R Molena, ISBN 88-8080-046-9, 2003Conference paper (Refereed)
  • 29.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Pulsed Atmospheric Pressure Plasma Reforming Of Ethanol2016In: Hakone XV: International Symposium On High Pressure Low Temperature Plasma Chemistry: With Joint Cost TD1208 Workshop: Non-Equilibrium Plasmas With Liquids For Water And Surface Treatment / [ed] Cernak, M; Hoder, T, 2016, p. 380-381Conference paper (Refereed)
    Abstract [en]

    The plasma source with a coaxial geometry was used for generation of plasma inside water and the ethanol-water mixtures. The hydrogen-rich synthesis gas with hydrogen content up to 60% was produced in submerged dc pulsed plasma. The effect of various plasma generation regimes on the performance of plasma, on the hydrogen production efficiency and on the reaction rise-time was examined. A role of the solution temperature, composition of the mixture and current delivered to the discharge are investigated.

  • 30.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Pulsed DC Hollow Cathode Deposition of Cr and CrN Films2007Conference paper (Refereed)
  • 31.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Special issue on atmospheric pressure plasma2013In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 234, p. 1-1Article in journal (Other academic)
  • 32.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity. BB Plasma Design AB, SE-75643 Uppsala, Sweden..
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity. BB Plasma Design AB, SE-75643 Uppsala, Sweden..
    Bardos, A.
    BB Plasma Design AB, SE-75643 Uppsala, Sweden..
    Magnetized hollow cathode activated magnetron2015In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 107, no 15, article id 153501Article in journal (Refereed)
    Abstract [en]

    Planar magnetron in which the target is coupled with a magnetized hollow cathode is presented. Detailed principles of such arrangements are explained. The hollow cathode activated magnetron produces intense and stable plasmas in a wider interval of the working gas pressures as compared to the conventional magnetrons at the same power. The developed arrangements enhance sputtering from the magnetron target by the high-density hollow cathode plasma and increase the number of sputtered/evaporated species. Results of the test experiments of these arrangements on a commercial planar magnetron with the Ti target are presented and their capabilities discussed.

  • 33.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Abnormal High Rate Deposition of TiN Films by the Radio Frequency Plasma Jet System1995In: J Electrochem Soc, ISSN 0013-4651, Vol. 142, no 3, p. 883-887Article in journal (Refereed)
    Abstract [en]

    Radio frequency Ar and Ar + N-2 plasma jets generated in a hollow electrode terminated by a small size Ti nozzle were used for deposition of Ti and TiN films. The regime with low content of reactive gas resulted in an extreme enhancement of TiN deposition

  • 34.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Characterization of the linear arc discharge (LAD) source for film deposition1997In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 94-5, no 1-3, p. 578-582Article in journal (Refereed)
    Abstract [en]

    The linear arc discharge (LAD) source is a parallel plate hollow cathode with a magnetic field perpendicular to the plates near the outlet slit of the cathode. The hollers cathode discharge is generated by radio frequency (rf) power and is confined mainly

  • 35.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Metastable assisted deposition of TiN films1995In: Appl Phys Lett, ISSN 0003-6951, Vol. 67, no 11, p. 1521-1523Article in journal (Refereed)
    Abstract [en]

    An excess heat from an exothermic reaction of metastable Ar (4(3)P(0)) and Ar (4(3)P(2)) atoms with N-2 molecules at low contents of N-2 in Ar was found to be responsible for an enhanced thermionic emission, an enhanced production of Ti target vapor, an i

  • 36.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    The radio frequency hollow cathode plasma jet arc for the film deposition1996In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, ISSN 0734-2101, Vol. 14, no 6, p. 3033-3038Article in journal (Refereed)
    Abstract [en]

    The radio frequency hollow cathode plasma jet (RPJ or RHCPJ) are discharge is studied for an activated reactive deposition of TiN films. The presence of low content of nitrogen in argon enables reaching the are regime at lower powers than in pure argon. T

  • 37.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Titanium nitride deposited by high rate rf hollow cathode plasma jet reactive process1995In: VACUUM, ISSN 0042-207X, Vol. 46, no 12, p. 1433-1438Article in journal (Refereed)
    Abstract [en]

    A radio frequency hollow cathode plasma jet (RPJ or RHCPJ) with a tubular Ti nozzle as a source of metal particles was used for the reactive deposition of TiN. The results of optical emission spectroscopy (OES), temperature measurements at the active zone

  • 38.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hot hollow cathode diffuse arc deposition of chromium nitride films2005In: J Vac Sci Technol, Vol. A23, no 4, p. 959-963Article in journal (Refereed)
  • 39.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hot Hollow Cathode Diffuse Arc Deposition of Chromium Nitride Films2004In: American Vacuum Society 51st Int Meeting, Anaheim,USA, November, 2004Conference paper (Refereed)
  • 40.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Nender, Claes
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Linear arc discharge (LAD): A new type of hollow cathode plasma source1996In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 87-8, no 1-3, p. 377-380Article in journal (Refereed)
    Abstract [en]

    A novel linearly scalable source for low pressure plasma processing is described. The source is based on a parallel plate hot hollow cathode in a focusing magnetic field which allows generation of a linearly uniform plasma in a gas admitted into the slit

  • 41.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Silins, Kaspars
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Amorphous Carbon Films on Glass Prepared by Hollow Cathodes at Moderate Pressure2016In: ECS Journal of Solid State Science and Technology, ISSN 2162-8769, E-ISSN 2162-8777, Vol. 5, no 9, p. N57-N60Article in journal (Refereed)
  • 42.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Söderström, Daniel
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Cold Atmospheric Plasma in Nitrogen and Air Generated by the Hybrid Plasma Source2005In: AVS 52nd Int. Meeting, Boston, October-November 2005, Paper PS-WeA3., 2005Conference paper (Other scientific)
  • 43.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillstpndets elektronik.
    Söderström, Daniel
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hybrid Atmospheric Plasma in Molecular Gas2006Conference paper (Refereed)
  • 44.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Carlsson, Patrik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Nender, Claes
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hysteresis effects in the sputtering process using two reactive gases1995In: Thin Solid Films, ISSN 0040-6090, Vol. 260, no 2, p. 181-186Article in journal (Refereed)
    Abstract [en]

    The reactive sputtering process involving two reactive gases has been investigated. Sputtering titanium in the presence of oxygen and nitrogen in argon was studied by means of optical emission and mass spectrometries. The experiments reveal the mechanism

  • 45.
    Bardos, L
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, H
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hot Hollow Cathode Arc Deposition of Highly Oriented Chromium and Chromium Nitride Films2004In: Proc of the 47th Annual Tech Conf of the Society of Vacuum Coaters (SVC), Dallas, USA, April 2004, 2004, p. Paper E-3, p. 91Conference paper (Refereed)
  • 46.
    Bardos, Ladislav
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Atmospheric Plasma – Yes or No2006In: Bulletin, Publication of the Vacuum Coating Industry, Summer 2006, 42-48., p. 42-48Article in journal (Refereed)
  • 47.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Characterization of the Cold Atmospheric Plasma Hybrid Source2005In: J Vac Sci Technol, Vol. A23, no 4, p. 933-937Article in journal (Refereed)
  • 48.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Characterization of the Cold Atmospheric Plasma Hybrid Source2004In: American Vacuum Society 51st Int Meeting, Anaheim, November, 2004, p. Paper PS-ThM4Conference paper (Refereed)
  • 49.
    Bardos, Ladislav
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Barankova, Hana
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Comparison of Pulsed DC and RF Hollow Cathode Depositions of CrN2007Conference paper (Other academic)
  • 50.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Comparison of the radio frequency hollow cathode to the microwave antenna discharge for plasma processing2001In: J Appl Phys, Vol. 90, no 4, p. 1703-1709Article in journal (Refereed)
123 1 - 50 of 116
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