Radio frequency Hollow Cathode based hybrid process integrating both Physical Vapor Deposition and Plasma Enhanced Chemical Vapor Deposition was used for deposition of amorphous carbon on glass samples. The films were subjected to high voltage pulses and the performance was compared with uncoated glass samples to test the protection ability of the films, the ability to prevent the deteriorating effects of corona flashovers/arcs. In contrast to the uncoated glass the well adherent carbon films with thicknesses between 3.5 and 17 mu m exhibited an excellent protection of the glass substrate against the flashovers/arc damages in both polarities of the electric field with voltages up to 300 kV.
A cylindrical chromium hollow cathode powered by a pulsed dc generator working in a constant power mode was used for PVD of chromium and chromium nitride films on silicon substrates in argon and nitrogen plasmas, respectively. A comparison of the pulsed dc process with the radio frequency hollow cathode depositions of Cr and CrN films at identical power levels shows considerable differences particularly in the deposition rate of Cr films. At the pulsed power above 250 W the hot cathode/diffuse arc regimes were reached with the cathode outlet temperature as high as 1300 degrees C and the maximum deposition rates of both Cr and CrN films exceeded 1 mu m/min. The resulting film properties, e.g. the microstructure and morphology were studied and compared with the films obtained by the rf hollow cathode PVD.
The process of generation of the radio frequency (r.f.) hollow cathode discharge was examined for different gases and different materials of the r.f. electrode. The delivered r.f. power range used in the experiments enabled analysis of the hollow cathode
The plasma source with a coaxial geometry was used for generation of plasma inside water and the ethanol-water mixtures. The hydrogen-rich synthesis gas with hydrogen content up to 60% was produced in submerged dc pulsed plasma. The effect of various plasma generation regimes on the performance of plasma, on the hydrogen production efficiency and on the reaction rise-time was examined. A role of the solution temperature, composition of the mixture and current delivered to the discharge are investigated.
The hysteresis effect in the reactive process was investigated in the magnetron with a magnetized hollow cathode enhanced target (HoCET) in which the target is coupled with the hollow cathode magnetized by the magnetic field of the magnetron. The process, where both the magnetron and hollow cathode plasmas are combined, is compared to the magnetron sputtering. The hysteresis curve in the magnetized HoCET magnetron, recording the titanium emission intensity versus varying content of nitrogen in the gas mixture exhibits a local maximum on the increasing part of the curve. The hysteresis curve is shifted to lower contents of nitrogen than the hysteresis curve for the magnetron. It is concluded that more efficient utilization of the reactive gas takes place in this device.
Planar magnetron in which the target is coupled with a magnetized hollow cathode is presented. Detailed principles of such arrangements are explained. The hollow cathode activated magnetron produces intense and stable plasmas in a wider interval of the working gas pressures as compared to the conventional magnetrons at the same power. The developed arrangements enhance sputtering from the magnetron target by the high-density hollow cathode plasma and increase the number of sputtered/evaporated species. Results of the test experiments of these arrangements on a commercial planar magnetron with the Ti target are presented and their capabilities discussed.
Radio frequency Ar and Ar + N-2 plasma jets generated in a hollow electrode terminated by a small size Ti nozzle were used for deposition of Ti and TiN films. The regime with low content of reactive gas resulted in an extreme enhancement of TiN deposition
The linear arc discharge (LAD) source is a parallel plate hollow cathode with a magnetic field perpendicular to the plates near the outlet slit of the cathode. The hollers cathode discharge is generated by radio frequency (rf) power and is confined mainly
An excess heat from an exothermic reaction of metastable Ar (4(3)P(0)) and Ar (4(3)P(2)) atoms with N-2 molecules at low contents of N-2 in Ar was found to be responsible for an enhanced thermionic emission, an enhanced production of Ti target vapor, an i
The radio frequency hollow cathode plasma jet (RPJ or RHCPJ) are discharge is studied for an activated reactive deposition of TiN films. The presence of low content of nitrogen in argon enables reaching the are regime at lower powers than in pure argon. T
A radio frequency hollow cathode plasma jet (RPJ or RHCPJ) with a tubular Ti nozzle as a source of metal particles was used for the reactive deposition of TiN. The results of optical emission spectroscopy (OES), temperature measurements at the active zone
A novel linearly scalable source for low pressure plasma processing is described. The source is based on a parallel plate hot hollow cathode in a focusing magnetic field which allows generation of a linearly uniform plasma in a gas admitted into the slit
Magnetized Hollow Cathode Activated Magnetron in which the target is coupled with the hollow cathode magnetized by the magnetic field of the magnetron was tested in the reactive process of TiN deposition. Increased deposition rate compared to the Ti metal deposition rate was confirmed. The depositions as well as optical measurements were performed at several pressures in the reactor. The results of the TiN reactive deposition are presented and discussed, including the TiN deposition in pure nitrogen.
The present paper summarizes the main features of the hollow cathode discharges generated by a radio frequency (r.f.) instead of a d.c. held. The pressure of gas inside the hollow cathode is almost independent on the reactor pressure, which allows to gene