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  • 1.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hot hollow cathode diffuse arc deposition of chromium nitride films2005In: J Vac Sci Technol, Vol. A23, no 4, p. 959-963Article in journal (Refereed)
  • 2.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hot Hollow Cathode Diffuse Arc Deposition of Chromium Nitride Films2004In: American Vacuum Society 51st Int Meeting, Anaheim,USA, November, 2004Conference paper (Refereed)
  • 3.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of Substrate Material and Bias on Properties of TiN Films Deposited in the Hybrid Plasma Reactor2005In: AVS 52nd Int. Meeting, Boston, October-November 2005, Paper PS+TF-ThA7, 2005Conference paper (Other scientific)
  • 4.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Teer, D G
    New microwave and hollow cathode hybrid plasma sources2004In: Surface and Coatings Technology, Vol. 177-178, p. 651-656Article in journal (Refereed)
  • 5.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of ferromagnetic substrates on the film growth in magnetized plasma systems2005In: Int. Conf. Metall. Coat.&Thin Films - ICMCTF-05, San Diego, May 2005, Paper G3-11., 2005Conference paper (Other scientific)
  • 6.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of ferromagnetic substrates on the film growth in magnetized plasma systems2005In: Surf Coat Techn, Vol. 200, p. 1862-1866Article in journal (Refereed)
  • 7.
    Bárdoš, Ladislav
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
    Baránková, Hana
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
    Gustavsson, L-E.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics.
    Effect of substrate material and bias on properties of TiN films deposited in the hybrid plasma reactor2006In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, E-ISSN 1520-8559, Vol. 24, no 4, p. 1655-1659Article in journal (Refereed)
  • 8.
    Gustavsson, Lars-Erik
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Properties of TiN Films Produced in Hollow Cathode and Microwave ECR Hybrid Plasma System2005In: E-MRS Spring Meeting, Strasbourg, May-June 2005, Paper K-VII.3., 2005Conference paper (Other scientific)
  • 9.
    Gustavsson, Lars-Erik
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    PVD of Films on Ferromagnetic Substrates in Magnetized Plasma Systems2005In: Paper E-8, Proceedings of the 48th Annual Tech. Conf. of the Society of Vacuum Coaters (SVC), Denver, April 2005, 2005, p. p. 27-30Conference paper (Other scientific)
  • 10.
    Gustavsson, Lars-Erik
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
    Baránková, Hana
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
    Bárdoš, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
    Some properties of TiN films produced in hollow cathode and microwave ECR hybrid plasma system2006In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 201, no 3-4, p. 1464-1468Article in journal (Refereed)
    Abstract [en]

    Properties of TiN films grown in a hybrid system combining linear magnetized hollow cathode with Ti plates and an electron cyclotron resonance (ECR) microwave plasma were studied. The films of 0.5-1.6 μm in thickness were deposited on both high-speed steel (HSS) and Si substrates. High quality films with dense microstructure and high hardness were obtained. Microstructure was studied by X-ray diffraction (XRD), scanning electron microscopy (SEM) was used for study of the surface morphology and the film-substrate interface, and mechanical properties were evaluated by nano indentation. It has been found that the interaction of the microwave power with both the substrate and the growing film can affect the growth regime and consequently the film properties. Formation of interfacial film defects is more frequent on Si substrates than on steel due to an absorption of the microwave power in the Si substrate during deposition. This effect was confirmed by temperature measurements. The TiN film properties were compared with reference samples deposited by conventional methods. The films obtained by the hybrid source reach quality comparable or even better than the best commercial TiN films.

1 - 10 of 10
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  • fi-FI
  • nn-NO
  • nn-NB
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  • Other locale
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Output format
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  • text
  • asciidoc
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