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  • 1. Aldaeus, F
    et al.
    Johansson, L E
    Jönsson, Mats
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Jonsson, G
    Lindberg, Ulf
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Roerade, J
    Hamp, S
    Escherica Coli Behavior in an Open Dielectrophoretic Microsystem2004In: 4th Workshop on Nanochemistry and Nanotechnology, 25-27 Aug, 2004Conference paper (Other scientific)
  • 2.
    Andersson, Joakim
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Physics, Department of Physics. Department of Physics and Materials Science, Physics II. Materials Science. Technology, Department of Engineering Sciences, Electronics. Fysik II.
    Forsberg, Markus
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Department of Physics and Materials Science, Physics II. Materials Science. Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollman, Patrik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Department of Physics and Materials Science, Physics II. Materials Science. Technology, Department of Engineering Sciences, Electronics. Materialvetenskap.
    Jacobson, Staffan
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Department of Physics and Materials Science, Physics II. Materials Science. Technology, Department of Engineering Sciences, Electronics. Materialvetenskap.
    A geometrically defined all-diamond pad conditioner2005In: World Tribology Congress III, Washington., 2005Conference paper (Refereed)
  • 3.
    Ankarcrona, Johan
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    High Frequency Analysis of LDMOS Transistors2004Licentiate thesis, monograph (Other scientific)
  • 4.
    Ankarcrona, Johan
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Olsson, Jörgen
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    SPICE Modeling of High Voltage LDMOS Transistors2001In: The 19th Nordic Semiconductor Meeting, Copenhagen, Denmark, May, 2001Conference paper (Refereed)
  • 5. Baker, A.M.
    et al.
    Köhler, Johan
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. ÅSTC.
    Mistry, S
    Lecuyot, A
    Liddle, D
    Miniaturised propulsion & navigation systems for orbit control of low cost space missions2005In: 5th Round Table on Micro/Nano Technologies for Space, Oct 3-5, Noordwijk NL, 2005Conference paper (Refereed)
  • 6. Bakke, T
    et al.
    Köhler, Johan
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Materials Science. ÅSTC. Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics.
    Bäcklund, Ylva
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Materials Science. Fasta tillståndets elektronik. Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics.
    Mukherjee, S
    Silicon semi-circular tapered structures made by diffusion limited HF:HNO3 wet etching1998In: Micromechanics Europe 1988, MME'98, Ulvik Norge, 1998Conference paper (Refereed)
  • 7.
    Barankova, H
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, L
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    High-rate hot hollow cathode arc deposition of chromium and chromium nitride films2004In: Surf Coat Technol, Vol. 188-189, p. 703-707Article in journal (Refereed)
  • 8.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Cold atmospheric plasma sources2002In: INVITED PAPER, ANZIO 2002, 5th Symp.Europ.Vac.Coaters, September 30, Rome-Anzio, Italy, abstract only, 2002Conference paper (Refereed)
  • 9.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Cold atmospheric plasma sources based on hollow cathodes2002In: INVITED presentation at 1st Topical Meeting on Pulsed and Atmospheric Pressure Plasma Processing, FMT - Forschungszentrum für Mikrostrukturtechnik, Univestity of Wuppertal, Wuppertal, March 2002, 2002Conference paper (Refereed)
  • 10.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Cold Atmospheric Plasma Sources for Surface Treatment2003In: The 46th Annual Tech Conf of the Society of acuum Coaters (SVC), San Francisco, May 2003, Invited talk P-1, 2003, p. 427-430Conference paper (Refereed)
  • 11.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of gas and cathode material on the r.f. hollow cathode reactive PVD1999In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 121, p. 704-708Article in journal (Refereed)
    Abstract [en]

    The process of generation of the radio frequency (r.f.) hollow cathode discharge was examined for different gases and different materials of the r.f. electrode. The delivered r.f. power range used in the experiments enabled analysis of the hollow cathode

  • 12.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of magnetic field configuration on the performance of hollow cathode linear arc discharge (LAD) source1998In: Int.Conf.Metall.Coat.&Thin Films - ICMCTF-98, San Diego, Paper G.3-7, 1998Conference paper (Refereed)
  • 13.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of the gas and cathode material on the rf hollow cathode performance1998In: Paper at The 193rd Meet.of the Elecctrochem. Soc., San Diego, May, Ext.abstract 203. Proc. Vol. 98-1.The Electrochem. Soc., Inc, 1998, p. 203-Conference paper (Refereed)
  • 14.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Fused hollow cathode cold atmospheric plasma2000In: Appl Phys Letters, Vol. 76, no 3, p. 285-287Article in journal (Refereed)
  • 15.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Fused hollow cathode cold atmospheric plasma cource for gas treatment2002In: Catalysis Today, Vol. 72, p. 237-241Article in journal (Refereed)
  • 16.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Fused hollow cathode cold atmospheric plasma in monoatomic and molecular gases2002In: Symposium on Cold atmospheric Plasma Technologies, 202nd Meeting of The Electrochemical Society, Salt Lake City, October, abstract No. 458, 2002Conference paper (Refereed)
  • 17.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Fused hollow cathode cold atmospheric plasma source2001In: 1st Symposium on Cold atmospheric Plasma Technologies, The Electrochemical Society Spring Meeting, Washington, 2001Conference paper (Refereed)
  • 18.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    High Density Plasma PVD of CrN Films2004In: 6th Symp European Vacuum Coaters, September 2004, Rome-Anzio, Italy, 2004, p. Invited paper-Conference paper (Other scientific)
  • 19.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow Cathode and Hybride Plasma Processing2005In: Proc of the 8th Int Symp on Sputtering & Plasma Processes (ISSP 2005), Kanazawa, Japan, June, PP1-3, 2005, p. p. 234-238Conference paper (Other scientific)
  • 20.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow Cathode and Hybride Plasma Processing2006In: Vacuum 80 (2006) 688-692., p. 688-692Article in journal (Refereed)
  • 21.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow cathode atmospheric pressure plasma sources for surface treatment2003In: Surface and Coatings Technology, Vol. 174-175, p. 63-67Article in journal (Refereed)
  • 22.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow cathode atmospheric pressure plasma sources for surface treatment2002In: , 8th International Conference on Plasma Surfaced Engineering - PSE 2002, Garmisch-Partenkirchen, September, Keynote lecture K8, 2002Conference paper (Refereed)
  • 23.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow cathode cold atmospheric plasma sources with monoatomic and molecular gases2003In: Surf Coat Technol, Vol. 163-164, p. 649-653Article in journal (Refereed)
  • 24.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow cathode cold atmospheric plasma sources with monoatomic and molecular gases2002In: Int.Conf.Metall.Coat.&Thin Films - ICMCTF-02, April, San Diego, 2002Conference paper (Refereed)
  • 25.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow Cathode Plasma Cleaning and Surface Activation2002In: Vacuum & Coating Technology NovemberArticle in journal (Refereed)
  • 26.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow Cathode Plasma Cleaning and Surface Activation2002In: Proceedings of the 45th Annual Tech.Conf. of the Society of Vacuum Coaters (SVC), Orlando, April 2002, www.svc.org., Proc, 2002, p. 109-112Conference paper (Refereed)
  • 27.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillstånndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillstånndets elektronik.
    Hollow cathode plasma sources for large area surface treatment2001In: Invited paper at Int.Conf.Metall.Coat.&Thin Films - ICMCTF-01, San Diego, 2001Conference paper (Refereed)
  • 28.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow cathode plasma sources for large area surface treatment2001In: Surf Coat Technol, Vol. 146-147, p. 486-490Article in journal (Refereed)
  • 29.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    New hybrid source of cold atmospheric plasma2004In: Surface and Coatings Technology, Vol. 177-178, p. 688-692Article in journal (Refereed)
  • 30.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    New hybrid source of cold atmospheric plasma2003In: ICMCTF´03, San Diego, April, 2003Conference paper (Refereed)
  • 31.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    New Plasma Sources for PE CVD2003In: Invited paper, 1st Int Symposium on Design and Technology of Coatings, Bonassola, Italy September 24-26, Proc ed by E Olzi and R Molena, ISBN 88-8080-046-9, 2003Conference paper (Refereed)
  • 32.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Abnormal High Rate Deposition of TiN Films by the Radio Frequency Plasma Jet System1995In: J Electrochem Soc, ISSN 0013-4651, Vol. 142, no 3, p. 883-887Article in journal (Refereed)
    Abstract [en]

    Radio frequency Ar and Ar + N-2 plasma jets generated in a hollow electrode terminated by a small size Ti nozzle were used for deposition of Ti and TiN films. The regime with low content of reactive gas resulted in an extreme enhancement of TiN deposition

  • 33.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Characterization of the linear arc discharge (LAD) source for film deposition1997In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 94-5, no 1-3, p. 578-582Article in journal (Refereed)
    Abstract [en]

    The linear arc discharge (LAD) source is a parallel plate hollow cathode with a magnetic field perpendicular to the plates near the outlet slit of the cathode. The hollers cathode discharge is generated by radio frequency (rf) power and is confined mainly

  • 34.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Metastable assisted deposition of TiN films1995In: Appl Phys Lett, ISSN 0003-6951, Vol. 67, no 11, p. 1521-1523Article in journal (Refereed)
    Abstract [en]

    An excess heat from an exothermic reaction of metastable Ar (4(3)P(0)) and Ar (4(3)P(2)) atoms with N-2 molecules at low contents of N-2 in Ar was found to be responsible for an enhanced thermionic emission, an enhanced production of Ti target vapor, an i

  • 35.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    The radio frequency hollow cathode plasma jet arc for the film deposition1996In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, ISSN 0734-2101, Vol. 14, no 6, p. 3033-3038Article in journal (Refereed)
    Abstract [en]

    The radio frequency hollow cathode plasma jet (RPJ or RHCPJ) are discharge is studied for an activated reactive deposition of TiN films. The presence of low content of nitrogen in argon enables reaching the are regime at lower powers than in pure argon. T

  • 36.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Titanium nitride deposited by high rate rf hollow cathode plasma jet reactive process1995In: VACUUM, ISSN 0042-207X, Vol. 46, no 12, p. 1433-1438Article in journal (Refereed)
    Abstract [en]

    A radio frequency hollow cathode plasma jet (RPJ or RHCPJ) with a tubular Ti nozzle as a source of metal particles was used for the reactive deposition of TiN. The results of optical emission spectroscopy (OES), temperature measurements at the active zone

  • 37.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hot hollow cathode diffuse arc deposition of chromium nitride films2005In: J Vac Sci Technol, Vol. A23, no 4, p. 959-963Article in journal (Refereed)
  • 38.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hot Hollow Cathode Diffuse Arc Deposition of Chromium Nitride Films2004In: American Vacuum Society 51st Int Meeting, Anaheim,USA, November, 2004Conference paper (Refereed)
  • 39.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Nender, Claes
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Linear arc discharge (LAD): A new type of hollow cathode plasma source1996In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 87-8, no 1-3, p. 377-380Article in journal (Refereed)
    Abstract [en]

    A novel linearly scalable source for low pressure plasma processing is described. The source is based on a parallel plate hot hollow cathode in a focusing magnetic field which allows generation of a linearly uniform plasma in a gas admitted into the slit

  • 40.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Söderström, Daniel
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Cold Atmospheric Plasma in Nitrogen and Air Generated by the Hybrid Plasma Source2005In: AVS 52nd Int. Meeting, Boston, October-November 2005, Paper PS-WeA3., 2005Conference paper (Other scientific)
  • 41.
    Barankova, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillstpndets elektronik.
    Söderström, Daniel
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hybrid Atmospheric Plasma in Molecular Gas2006Conference paper (Refereed)
  • 42.
    Barankova, Hana
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Carlsson, Patrik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Nender, Claes
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hysteresis effects in the sputtering process using two reactive gases1995In: Thin Solid Films, ISSN 0040-6090, Vol. 260, no 2, p. 181-186Article in journal (Refereed)
    Abstract [en]

    The reactive sputtering process involving two reactive gases has been investigated. Sputtering titanium in the presence of oxygen and nitrogen in argon was studied by means of optical emission and mass spectrometries. The experiments reveal the mechanism

  • 43.
    Bardos, L
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, H
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hot Hollow Cathode Arc Deposition of Highly Oriented Chromium and Chromium Nitride Films2004In: Proc of the 47th Annual Tech Conf of the Society of Vacuum Coaters (SVC), Dallas, USA, April 2004, 2004, p. Paper E-3, p. 91Conference paper (Refereed)
  • 44.
    Bardos, Ladislav
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Radio frequency hollow cathodes for the plasma processing technology1996In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 86-87, no 1-3, p. 648-656Article in journal (Refereed)
    Abstract [en]

    The present paper summarizes the main features of the hollow cathode discharges generated by a radio frequency (r.f.) instead of a d.c. held. The pressure of gas inside the hollow cathode is almost independent on the reactor pressure, which allows to gene

  • 45.
    Bardos, Ladislav
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Atmospheric Plasma – Yes or No2006In: Bulletin, Publication of the Vacuum Coating Industry, Summer 2006, 42-48., p. 42-48Article in journal (Refereed)
  • 46.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Characterization of the Cold Atmospheric Plasma Hybrid Source2005In: J Vac Sci Technol, Vol. A23, no 4, p. 933-937Article in journal (Refereed)
  • 47.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Characterization of the Cold Atmospheric Plasma Hybrid Source2004In: American Vacuum Society 51st Int Meeting, Anaheim, November, 2004, p. Paper PS-ThM4Conference paper (Refereed)
  • 48.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Comparison of the radio frequency hollow cathode to the microwave antenna discharge for plasma processing2001In: J Appl Phys, Vol. 90, no 4, p. 1703-1709Article in journal (Refereed)
  • 49.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Highly oriented coatings at low substrate temperatures2002In: Vacuum & Coating Technology NovemberArticle in journal (Refereed)
  • 50.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Highly Oriented Coatings at Low Substrate Temperatures2001In: Proceedings of the 44th Annual Tech.Conf. of the Society of Vacuum Coaters (SVC), Philadelphia, April, Proc., 2001, p. 125-129Conference paper (Refereed)
1234567 1 - 50 of 488
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