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  • 51.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Characterization of the Cold Atmospheric Plasma Hybrid Source2004In: American Vacuum Society 51st Int Meeting, Anaheim, November, 2004, p. Paper PS-ThM4Conference paper (Refereed)
  • 52.
    Bardos, Ladislav
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Barankova, Hana
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Comparison of Pulsed DC and RF Hollow Cathode Depositions of CrN2007Conference paper (Other academic)
  • 53.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Comparison of the radio frequency hollow cathode to the microwave antenna discharge for plasma processing2001In: J Appl Phys, Vol. 90, no 4, p. 1703-1709Article in journal (Refereed)
  • 54.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Highly oriented coatings at low substrate temperatures2002In: Vacuum & Coating Technology NovemberArticle in journal (Refereed)
  • 55.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Highly Oriented Coatings at Low Substrate Temperatures2001In: Proceedings of the 44th Annual Tech.Conf. of the Society of Vacuum Coaters (SVC), Philadelphia, April, Proc., 2001, p. 125-129Conference paper (Refereed)
  • 56.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow Cathode Based Plasma Sources and Applications2005In: Proceedings of the 15th Symp. on Applications and Plasma Processes and 3rd EU-Japan Joint Symp. on Plasma Processing (SAPP XV), Podbanské, Slovakia, January 2005, IL01, 2005, p. p. 19-22Conference paper (Other scientific)
  • 57.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Hollow cathode PVD of nitride and oxide films at low substrate temperature2001In: Surf Coat Technol, Vol. 146-147, p. 463-468Article in journal (Refereed)
  • 58.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    New hybrid source with microwave and hollow cathode plasma2003In: 46th Annual Tech Conf of the Society of Vacuum Coaters (SVC), San Francisco, May, Paper E-8, Proc., 2003, p. 104-107Conference paper (Refereed)
  • 59.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    New microwave and hollow cathode hybrid plasma sources2003In: Int Conf Metal Coat Thin Films, ICMCTF´03, San Diego, April, 2003, p. Paper G1/TS1-1Conference paper (Refereed)
  • 60.
    Bardos, Ladislav
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Barankova, Hana
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Plasma Processes at Atmospheric and Low Pressures2007Conference paper (Refereed)
  • 61.
    Bardos, Ladislav
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Barankova, Hana
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Plasma processes at atmospheric and low pressures2008In: Vacuum, ISSN 0042-207X, E-ISSN 1879-2715, Vol. 83, no 3, p. 522-527Article in journal (Refereed)
    Abstract [en]

    In the last few decades there has been an intense development in non-equilibrium ("cold") plasma surface processing systems at atmospheric pressure. This new trend is stimulated mainly to decrease equipment costs by avoiding expensive pumping systems of conventional low-pressure plasma devices. This work summarizes physical and practical limitations where atmospheric plasmas cannot compete with low-pressure plasma and vice-versa. As the processing conditions for atmospheric plasma are rather different from reduced pressure systems in many cases these conditions may increase final equipment costs substantially. In this work we briefly review the main principles, advantages and drawbacks of atmospheric plasma for a better understanding of the capabilities and limitations of the atmospheric plasma processing technology compared with conventional low-pressure plasma processing. 2008 Elsevier Ltd. All rights reserved.

  • 62.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Processing in Afterglows and Decaying Plasmas2001In: Vacuum & Coating Technology, Vol. Sept, p. 46-56Article in journal (Refereed)
  • 63.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    PVD of hard films inside narrow holes and pipes2003In: The 46th Annual Tech Conf of the Society of Vacuum Coaters (SVC), San Francisco, May, Paper H-5, Proc., 2003, p. 154-154Conference paper (Refereed)
  • 64.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Radio frequency hollow cathode source for large area cold atmospheric plasma applications2000In: Surface and Coatings Technology, Vol. 133-134, p. 522-527Article in journal (Refereed)
  • 65.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    A new method for film deposition in the discharge of target metal vapour1995In: Surface and Coatings Technology, ISSN 0257-8972, Vol. 72, no 3, p. 174-180Article in journal (Refereed)
    Abstract [en]

    A new method for generation of a discharge in its own metal vapour of an r.f.-excited electrode is described. The method is based on the r.f. plasma jet (RPJ) system utilizing a small size r.f. nozzle in which a hollow cathode-type discharge is generated.

  • 66.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Linear arc discharge source for large area plasma processing1997In: Appl Phys Lett, Vol. 70, p. 577-579Article in journal (Refereed)
  • 67.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Microwave surfatron system for diamond film depositions1995In: International Symposium on Plasma Chemistry – ISPC 12, Minneapolis, USA, August 21-25, Paper no PK 1, 1995Conference paper (Refereed)
  • 68.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Microwave surfatron system for plasma processing1996In: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, ISSN 0734-2101, Vol. 14, no 2, p. 474-477Article in journal (Refereed)
  • 69.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    PECVD by hollow cathodes1998In: Proceedings of the 41st Annual Tech.Conf. of the Society of Vacuum Coaters (SVC), Boston 1998, ISSN 0737-5921, Paper P-1, Proc., 1998, p. 315-320Conference paper (Refereed)
  • 70.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Thin film processing by the radio frequency hollow cathodes1997In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 97, no 1-3, p. 723-728Article in journal (Refereed)
    Abstract [en]

    The main features of the radio frequency (RF) hollow cathodes for thin film processing are summarized. The utilization of cylindrical RF hollow cathodes in both the plasma-enhanced chemical vapour deposition (PECVD) and the physical vapour deposition (PVD

  • 71.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of Substrate Material and Bias on Properties of TiN Films Deposited in the Hybrid Plasma Reactor2005In: AVS 52nd Int. Meeting, Boston, October-November 2005, Paper PS+TF-ThA7, 2005Conference paper (Other scientific)
  • 72.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Teer, D G
    New microwave and hollow cathode hybrid plasma sources2004In: Surface and Coatings Technology, Vol. 177-178, p. 651-656Article in journal (Refereed)
  • 73.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Lebedev, Y A
    Performance of Radio Frequency Hollow Cathodes at Low Gas Pressures2003In: Surf Coat Technol, Vol. 163-164, p. 654-658Article in journal (Refereed)
  • 74.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Lebedev, Y A
    Performance of Radio Frequency Hollow Cathodes at Low Gas Pressures2002In: Int.Conf.Metall.Coat.&Thin Films - ICMCTF-02, April 2002, San Diego, 2002Conference paper (Refereed)
  • 75.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Lebedev, Y A
    Nyberg, Tomas
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Berg, Sören
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Diamond deposition in a microwave electrode discharge at reduced pressures1997In: DIAMOND AND RELATED MATERIALS, ISSN 0925-9635, Vol. 6, no 2-4, p. 224-229Article in journal (Refereed)
    Abstract [en]

    Diamond deposition on healed Si-substrates was studied under microwave discharge generated by an electrode-antenna either in a ''point-to-plane'' arrangement or in a ''parallel-plane'' arrangement at gas pressures of 1-15 Torr in a mixture of hydrogen wit

  • 76.
    Bardos, Ladislav
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity. BB Plasma Design AB, Ullerakersvagen 64, SE-75643 Uppsala, Sweden..
    Baránková, Hana
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity. BB Plasma Design AB, Ullerakersvagen 64, SE-75643 Uppsala, Sweden..
    Bardos, A.
    BB Plasma Design AB, Ullerakersvagen 64, SE-75643 Uppsala, Sweden..
    Production of Hydrogen-Rich Synthesis Gas by Pulsed Atmospheric Plasma Submerged in Mixture of Water with Ethanol2017In: Plasma chemistry and plasma processing, ISSN 0272-4324, E-ISSN 1572-8986, Vol. 37, no 1, p. 115-123Article in journal (Refereed)
    Abstract [en]

    Hydrogen-rich synthesis gas was produced by pulsed dc plasma submerged into ethanol-water mixtures using an original system with a coaxial geometry. The ignition of the discharge is immediately followed by production of hydrogen and after a short time necessary for filling the outlet tubing a flame can be ignited. No auxiliary gas was used for the reforming process. The synthesis gas containing up to 60% of hydrogen was formed, at the outflow rate of 250 sccm at the average power as low as 10 W. The hydrogen production efficiency corresponds to 12 kWh/kg H-2.

  • 77.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of ferromagnetic substrates on the film growth in magnetized plasma systems2005In: Int. Conf. Metall. Coat.&Thin Films - ICMCTF-05, San Diego, May 2005, Paper G3-11., 2005Conference paper (Other scientific)
  • 78.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Gustavsson, Lars-Erik
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Barankova, Hana
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Effect of ferromagnetic substrates on the film growth in magnetized plasma systems2005In: Surf Coat Techn, Vol. 200, p. 1862-1866Article in journal (Refereed)
  • 79.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Lebedev, Y
    Features of a nonequilibrium microwave electrode discharge1998In: PLASMA PHYSICS REPORTS, ISSN 1063-780X, Vol. 24, no 10, p. 891-895Article in journal (Refereed)
    Abstract [en]

    The luminosity structure of a microwave discharge excited in hydrogen and hydrogen-methane mixtures (1-8% methane) between the rod electrode and the plane surface in a cylindrical metallic discharge chamber at a pressure of 1-15 torr and an input power of

  • 80.
    Bardos, Ladislav
    et al.
    Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
    Lebedev, Y
    Spherical Microwave Electrode Discharge. Phenomenology and results of probe measurements1998In: Technical Physics, Vol. 43, no 12, p. 1428-Article in journal (Refereed)
  • 81.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Hollow cathode and hybrid atmospheric plasma sources2008In: Pure and Applied Chemistry, ISSN 0033-4545, E-ISSN 1365-3075, Vol. 80, no 9, p. 1931-1937Article in journal (Refereed)
    Abstract [en]

    Generation and features of the radio frequency (RF) hollow cathode discharge (HCD) are compared for the atmospheric and moderate pressures. The atmospheric-pressure plasma systems, fused hollow cathode (FHC) and hybrid hollow electrode-activated discharge (H-HEAD), are described. Examples of applications where both FHC and H-HEAD have already been employed are given, and potentials for new processes are discussed.

  • 82.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity. BB Plasma Design AB, Ullerakersvagen 64, SE-75643 Uppsala, Sweden.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity. BB Plasma Design AB, Ullerakersvagen 64, SE-75643 Uppsala, Sweden.
    Bardos, Adela
    BB Plasma Design AB, Ullerakersvagen 64, SE-75643 Uppsala, Sweden.
    Non-Conventional Atmospheric Pressure Plasma Sources for Production of Hydrogen2018In: MRS ADVANCES, ISSN 2059-8521, Vol. 3, no 18, p. 921-929Article in journal (Refereed)
    Abstract [en]

    The atmospheric pressure plasma sources with a coaxial geometry were used for generation of the radio frequency, microwave and pulsed dc plasmas inside water and aqueous solutions. Pulsed dc plasma generated in ethanol-water mixtures leads to production of the hydrogen-rich synthesis gas with hydrogen content up to 65 % The effect of various plasma generation regimes on the performance of plasma, on the hydrogen production efficiency and on the hydrogen-rich synthesis gas production was examined. A role of the composition of the ethanol-water mixture was investigated.

  • 83.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bardos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Silins, Kaspars
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    DLC coatings prepared by hollow cathodes at moderate pressure2015Conference paper (Other academic)
    Abstract [en]

    DLC coatings were prepared using the rf powered cylindrical and linear hollow cathodes. The deposition process is hybrid, combining both the PE CVD and PVD. A cylindrical graphite nozzle and graphite plates were used as targets. The gas mixture used in the deposition process was argon with acetylene.

     

    Compared to e.g. magnetron sputtering, the optimum content of acetylene is lower. The effect of the acetylene content in the gas mixture as well as rf power on the deposition rate and properties of the coatings are evaluated.

     

    The geometrical effect is studied, the cylindrical hollow cathode and the linear hollow cathode are compared and the transfer of the optimized process from the cylindrical into the linear hollow cathode is discussed.

  • 84.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bàrdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Atmospheric pressure plasma conversion of CO2 to solid deposits2015In: Results in Physics, ISSN 2211-3797, Vol. 5, p. 257-258Article in journal (Refereed)
    Abstract [en]

    Fused Hollow Cathode (FHC) with aerodynamic stabilization was used for the gas conversion processes. During the conversion of NO into NO2 in air mixtures, the CO2 reduction occurs, without forming gaseous CO. In these processes brownish glassy solid deposits are formed in the plasma region. The deposits were analyzed by scanning electron microscopy, X-ray photoelectron spectroscopy and X-ray diffraction.

  • 85.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Atmospheric Pressure Plasma Sources and Processing2009In: Handbook of Deposition Technologies for Films and Coatings / [ed] Peter M. Martin, Oxford: Elsevier, William Andrew , 2009, 3, p. 865-880Chapter in book (Other (popular science, discussion, etc.))
  • 86.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Cold Atmospheric Plasma in Liquids2012Conference paper (Refereed)
  • 87.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Cold Atmospheric Plasma Inside Water2012Conference paper (Refereed)
  • 88.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Cold Atmospheric Plasma Processing of Inner Surfaces: INVITED PAPER2012Conference paper (Other academic)
  • 89.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Cold Atmospheric Plasma Treatment of Energy System Components: INVITED PAPER2010Conference paper (Other academic)
  • 90.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Convergion of Nitrogen Oxides by the Atmospheric Hollow Cathode Discharges: INVITED PAPER2010In: IEEE 37th International Conference on Plasma Science, Norfolk, Virginia, USA, 2010Conference paper (Other academic)
  • 91.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Conversion of Nitrogen and Carbon Oxides by the Atmospheric Hollow Cathode Discharges2012In: IEEE Transactions on Plasma Science, ISSN 0093-3813, E-ISSN 1939-9375, Vol. 40, no 5, p. 1324-1328Article in journal (Refereed)
    Abstract [en]

    We have successfully tested the fused hollow cathode with aerodynamic stabilization as a 100% oxidation catalyst in conversion of NOx in air mixtures. Plasma chemical kinetics and the processing window width are controlled by plasma characteristics. Results show that, besides the plasma source design itself, the material of the electrodes plays a crucial role. It was found that, by using graphite electrodes, a 100% removal of NO from the air mixtures is possible without necessity of adding hydrocarbons. This paper presents results of oxygen screening, discusses the mechanisms of the process, and reports also on the CO2 reduction in some discharge regimes.

  • 92.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Design and Applications of the Atmospheric Pressure Hollow Cathodes2008Conference paper (Other academic)
  • 93.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Design and Performance of the Hollow Cathode Cold Atmospheric Plasma Sources2008In: Jahrbuch Oberflächentechnik 2008-BAND 64 / [ed] R. Suchentrunk, Bad Saulgau: Eugen G. Leuze Verlag KG , 2008Chapter in book (Refereed)
  • 94.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Effect of the Electrode Material in the Atmospheric Plasma Abatement of Nitrogen Oxides: Paper SE -MoA32009Conference paper (Other academic)
  • 95.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Effect of the Electrode Material on the Atmospheric Plasma Conversion of NO in Air Mixtures2009Conference paper (Refereed)
  • 96.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Effect of the electrode material on the atmospheric plasma conversion of NO in air mixtures2010In: Vacuum, ISSN 0042-207X, E-ISSN 1879-2715, Vol. 84, no 12, p. 1385-1388Article in journal (Refereed)
    Abstract [en]

    Non-thermal atmospheric pressure plasma is widely used for conversion of hazardous gases. Results from different laboratories confirm importance of energy non-equilibrium in the plasma where dominant energy carriers are electrons and a dominant chemistry is based on formation and interactions of radicals. Because of rather high electric fields required for generation and sustaining of air discharges at atmospheric pressure many plasma systems were found rather to create a lot of NO instead of removing it. A widely supported way to clean NO and NO2 from air mixtures is a plasma assisted catalytic reduction where the cold plasma is combined with the solid-state catalyst. In an ideal case the plasma acts as an oxidation catalyst where an atomic oxygen from air oxidizes NO to NO2 and the solid-state catalysts are then capable to convert all NO2 to N-2 and O-2. In most cases it is also necessary to involve auxiliary gases, e.g., propylene, to make the process efficient enough. This work introduces an original cold plasma system based on atmospheric hollow cathodes generated by a nanopulse DC power with controllable voltage and pulse frequency. The system was optimized in both the geometry and the applied power. However, the material of electrodes was found to be the most important factor affecting the plasma performance and consequently the chemical kinetics. A 100% conversion of NO to NO2 was achieved with a graphite electrode, without using any auxiliary gas and without catalyst. Plasma performance and conversion efficiency are compared for several electrode materials.

  • 97.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Environmental Applications of the Atmospheric Pressure Plasma Sources: Paper JAPT-112009Conference paper (Refereed)
  • 98.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Hollow Cathode and Hybrid Plasma Processing at Low and High Pressures2008Conference paper (Refereed)
  • 99.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Hollow Cathode High Density Plasma PVD of Cr and CrN films2008Conference paper (Refereed)
  • 100.
    Baránková, Hana
    et al.
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    Bárdos, Ladislav
    Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
    New plasma sources for atmospheric pressure applications2008Conference paper (Refereed)
123 51 - 100 of 121
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