Open this publication in new window or tab >>Show others...
2025 (English)In: Vacuum, ISSN 0042-207X, E-ISSN 1879-2715, Vol. 231, article id 113824Article in journal (Refereed) Published
Abstract [en]
We present equipment for sample synthesis, preparation and modification enabling in-situ studies employing medium energy ion beams at the ion implanter facility of the Tandem Laboratory national research infrastructure at Uppsala University. The integral instrumentation enables controlled thin-film synthesis, modification and characterization applicable to study near-surface processes such as thin-film growth, phase transformation, oxidation, annealing, catalysis or ion implantation. We describe the available instrumentation with its specifications and present four demonstrative experiments with a particular focus on the acquired in-situ capabilities addressing 1) Evaporation and thermal alloying of thin films - nickel silicides 2) Reactive magnetron sputtering and controlled oxidization - photochromic YHO 3) Sputtering and low-energy implantation - hydrogen in tungsten and 4) Surface cleaning of sensitive systems - self-supporting silicon membranes.
Place, publisher, year, edition, pages
Elsevier, 2025
National Category
Materials Chemistry Condensed Matter Physics Fusion, Plasma and Space Physics
Identifiers
urn:nbn:se:uu:diva-544238 (URN)10.1016/j.vacuum.2024.113824 (DOI)001358772200001 ()2-s2.0-85208767832 (Scopus ID)
Funder
Swedish Research Council, 2019-00191
2024-12-042024-12-042024-12-12Bibliographically approved