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Publications (6 of 6) Show all publications
Weng, Y.-C., Nameirakpam, H., Andersson, E., Cartwright, E., Kamalakar, M. V., Hahlin, M. & Lindblad, A. (2025). Determination of inelastic mean free path for solid polymer electrolytes: PTMC:LiBOB and PCL:LiBOB. Applied Physics Letters, 126(18), Article ID 181601.
Open this publication in new window or tab >>Determination of inelastic mean free path for solid polymer electrolytes: PTMC:LiBOB and PCL:LiBOB
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2025 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 126, no 18, article id 181601Article in journal (Refereed) Published
Abstract [en]

X-ray photoelectron spectroscopy (PES) has been widely applied in the field of battery studies. However, the lack of knowledge regarding the inelastic mean free path (IMFP) for studied systems limits the interpretation of spectroscopic results. In this work, the IMFP of poly(trimethylene carbonate) (PTMC), poly( epsilon-caprolactone) (PCL), and the solid polymer electrolytes consisting of lithium bis(oxalate)borate (LiBOB) together with PTMC or PCL has been determined using PES at a photoelectron kinetic energy of 8.7 keV. Additionally, the surface roughness of these films was investigated by atomic force microscopy and correlated with calculated IMFP values. Our studies reveal that the IMFP of solid polymer electrolytes is higher than that of pure polymers. The presented IMFPs provide references for future spectroscopic studies involving these materials.

Place, publisher, year, edition, pages
American Institute of Physics (AIP), 2025
National Category
Materials Chemistry Physical Sciences
Identifiers
urn:nbn:se:uu:diva-566696 (URN)10.1063/5.0254600 (DOI)001483041400014 ()2-s2.0-105004927482 (Scopus ID)
Funder
Swedish Energy Agency, P2021-90225Swedish Energy Agency, 2019-01326Swedish Energy Agency, 2023-01607Swedish Research Council Formas, 2023-05291Swedish Research Council, 2021-05932Swedish Foundation for Strategic ResearchSwedish Research CouncilSwedish Research Council Formas
Available from: 2025-09-11 Created: 2025-09-11 Last updated: 2025-11-24Bibliographically approved
Belotcerkovtceva, D., Datt, G., Nameirakpam, H., Aitkulova, A., Suntornwipat, N., Majdi, S., . . . Kamalakar, M. V. (2025). Extreme Current Density and Breakdown Mechanism in Graphene on Diamond Substrate. Carbon, 237, Article ID 120108.
Open this publication in new window or tab >>Extreme Current Density and Breakdown Mechanism in Graphene on Diamond Substrate
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2025 (English)In: Carbon, ISSN 0008-6223, E-ISSN 1873-3891, Vol. 237, article id 120108Article in journal (Refereed) Published
Abstract [en]

The high current-carrying capacity of graphene is essential for its use as an interconnect in electronic and spintronic circuits. At the same time, knowing the breakdown limits and mechanism under high fields can enable new device design strategies. In this work, we push the current carrying capacity of the scalable form of chemical vapor deposited (CVD) graphene employing a high-thermal conducting single crystalline diamond substrate. Our experiments on CVD graphene reveal extremely high current densities > 109 A/cm2 in graphene on the diamond with both ohmic (low-resistive) and tunneling tunnel (high-resistive) contacts. Measurements on ferromagnetic (TiOx/Co) and metallic (Ti/Au) contacts demonstrate current densities of ∼1.16×109 A/cm2 and ∼1.7×109 A/cm2, respectively. The tunnel (high-resistive) contacts exhibit a shunting of graphene under high currents via the bottom graphitized diamond, resulting in dielectric breakdown and via alternative conducting paths. Electrical measurements show a distinct threshold for conducting paths of graphitized diamond, in tune accordance with Middleton-Wingreen's theory. Our results of high current densities achieved in CVD graphene, with distinct dependence on ohmic and tunneling, contact resistance, and the observed breakdown mechanism, provide new insights for enabling high-current all carbon circuits.

Place, publisher, year, edition, pages
Elsevier, 2025
Keywords
CVD Graphene, diamond, high current carrying capacity, fractal pattern
National Category
Condensed Matter Physics
Identifiers
urn:nbn:se:uu:diva-550657 (URN)10.1016/j.carbon.2025.120108 (DOI)001460969300001 ()2-s2.0-85218100128 (Scopus ID)
Funder
EU, European Research Council, 101002772Olle Engkvists stiftelse, 200–0602Swedish Energy Agency, 48698-1Swedish Energy Agency, 48591-1Swedish Research Council, 2021-05932Swedish Research Council, 22-04186-5Swedish Research Council Formas, 2019-01326Swedish Research Council Formas, 2023-01607Knut and Alice Wallenberg Foundation, 2022.0079
Available from: 2025-02-17 Created: 2025-02-17 Last updated: 2025-11-20Bibliographically approved
Riva, S., Johansson, F. O. L., Butorin, S., Comparotto, C., Donzel-Gargand, O., Thakur, P. K., . . . Rensmo, H. (2025). Surface Processing and Characterization of Stoichiometry-Varied BaZrS3 Thin Films. ACS Applied Energy Materials, 8(16), 12281-12293
Open this publication in new window or tab >>Surface Processing and Characterization of Stoichiometry-Varied BaZrS3 Thin Films
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2025 (English)In: ACS Applied Energy Materials, E-ISSN 2574-0962, Vol. 8, no 16, p. 12281-12293Article in journal (Refereed) Published
National Category
Condensed Matter Physics Materials Chemistry Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
urn:nbn:se:uu:diva-567835 (URN)10.1021/acsaem.5c01766 (DOI)
Funder
Swedish Research Council Formas, 2023-01607Swedish Research Council, 2018-04330Swedish Research Council, 2018-06465Swedish Research Council, 2020-06409Swedish Research Council, 2021-05932Swedish Research Council, 2022-06076Swedish Research Council, 2023-05072Swedish Energy Agency, P50626-1Knut and Alice Wallenberg FoundationÅForsk (Ångpanneföreningen's Foundation for Research and Development), 23-693StandUp
Available from: 2025-09-23 Created: 2025-09-23 Last updated: 2025-09-25
Belotcerkovtceva, D., Nameirakpam, H., Datt, G., Noumbe, U. & Kamalakar, M. V. (2024). High current treated-passivated graphene (CTPG) towards stable nanoelectronic and spintronic circuits. Nanoscale Horizons, 9(3), 456-464
Open this publication in new window or tab >>High current treated-passivated graphene (CTPG) towards stable nanoelectronic and spintronic circuits
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2024 (English)In: Nanoscale Horizons, ISSN 2055-6764, E-ISSN 2055-6756, Vol. 9, no 3, p. 456-464Article in journal (Refereed) Published
Abstract [en]

Achieving enhanced and stable electrical quality of scalable graphene is crucial for practical graphene device applications. Accordingly, encapsulation has emerged as an approach for improving electrical transport in graphene. In this study, we demonstrate high-current treatment of graphene passivated by AlOx nanofilms as a new means to enhance the electrical quality of graphene for its scalable utilization. Our experiments and electrical measurements on large-scale chemical vapor-deposited (CVD) graphene devices reveal that high-current treatment causes persistent and irreversible de-trapping density in both bare graphene and graphene covered by AlOx. Strikingly, despite possible interfacial defects in graphene covered with AlOx, the high-current treatment enhances its carrier mobility by up to 200% in contrast to bare graphene samples, where mobility decreases. Spatially resolved Raman spectroscopy mapping confirms that surface passivation by AlOx, followed by the current treatment, reduces the number of sp3 defects in graphene. These results suggest that for current treated-passivated graphene (CTPG), the high-current treatment considerably reduces charged impurity and trapped charge densities, thereby reducing Coulomb scattering while mitigating any electromigration of carbon atoms. Our study unveils CTPG as an innovative system for practical utilization in graphene nanoelectronic and spintronic integrated circuits.

Place, publisher, year, edition, pages
Royal Society of Chemistry, 2024
National Category
Condensed Matter Physics
Identifiers
urn:nbn:se:uu:diva-526688 (URN)10.1039/d3nh00338h (DOI)001140998600001 ()2-s2.0-85182721062 (Scopus ID)
Funder
Swedish Research Council, 2021-05932Swedish Energy Agency, 48698–1Swedish Research Council Formas, 2019–01326Olle Engkvists stiftelse, 200–0602EU, European Research Council, Project SPINNER
Available from: 2024-04-15 Created: 2024-04-15 Last updated: 2025-02-18Bibliographically approved
Sharma, R., Nameirakpam, H., Muradas Belinchón, D., Sharma, P., Noumbe, U., Belotcerkovtceva, D., . . . Kamalakar, M. V. (2024). Large-Scale Direct Growth of Monolayer MoS2 on Patterned Graphene for van der Waals Ultrafast Photoactive Circuits. ACS Applied Materials and Interfaces, 16(29), 38711-38722
Open this publication in new window or tab >>Large-Scale Direct Growth of Monolayer MoS2 on Patterned Graphene for van der Waals Ultrafast Photoactive Circuits
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2024 (English)In: ACS Applied Materials and Interfaces, ISSN 1944-8244, E-ISSN 1944-8252, Vol. 16, no 29, p. 38711-38722Article in journal (Refereed) Published
Abstract [en]

Two-dimensional (2D) van der Waals heterostructures combine the distinct properties of individual 2D materials, resulting in metamaterials, ideal for emergent electronic, optoelectronic, and spintronic phenomena. A significant challenge in harnessing these properties for future hybrid circuits is their large-scale realization and integration into graphene interconnects. In this work, we demonstrate the direct growth of molybdenum disulfide (MoS2) crystals on patterned graphene channels. By enhancing control over vapor transport through a confined space chemical vapor deposition growth technique, we achieve the preferential deposition of monolayer MoS2 crystals on monolayer graphene. Atomic resolution scanning transmission electron microscopy reveals the high structural integrity of the heterostructures. Through in-depth spectroscopic characterization, we unveil charge transfer in Graphene/MoS2, with MoS2 introducing p-type doping to graphene, as confirmed by our electrical measurements. Photoconductivity characterization shows that photoactive regions can be locally created in graphene channels covered by MoS2 layers. Time-resolved ultrafast transient absorption (TA) spectroscopy reveals accelerated charge decay kinetics in Graphene/MoS2 heterostructures compared to standalone MoS2 and upconversion for below band gap excitation conditions. Our proof-of-concept results pave the way for the direct growth of van der Waals heterostructure circuits with significant implications for ultrafast photoactive nanoelectronics and optospintronic applications.

Place, publisher, year, edition, pages
American Chemical Society (ACS), 2024
Keywords
Graphene, TMDs, Field effect transistor, van der Waals heterostructure, ultrafast, photoactivecircuits
National Category
Condensed Matter Physics Atom and Molecular Physics and Optics
Identifiers
urn:nbn:se:uu:diva-536484 (URN)10.1021/acsami.4c07028 (DOI)001276294900001 ()38995218 (PubMedID)
Funder
EU, European Research Council, 101002772Swedish Energy Agency, 48698-1Swedish Research Council, 2021-05932Swedish Research Council Formas, 2019-01326Swedish Research Council Formas, 2023-01607Olle Engkvists stiftelse, 200-0602Carl Tryggers foundation , CTS 18:271EU, Horizon 2020, 945478
Available from: 2024-08-22 Created: 2024-08-22 Last updated: 2024-08-22Bibliographically approved
Li, Z., Nameirakpam, H., Berggren, E., Noumbe, U., Kimura, T., Asakura, E., . . . Kamalakar, M. V. (2024). Synchronized Photoluminescence and Electrical Mobility Enhancement in 2D WS2 through Sequence-Specific Chemical Passivation. Journal of the American Chemical Society, 146(51), 35146-35154
Open this publication in new window or tab >>Synchronized Photoluminescence and Electrical Mobility Enhancement in 2D WS2 through Sequence-Specific Chemical Passivation
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2024 (English)In: Journal of the American Chemical Society, ISSN 0002-7863, E-ISSN 1520-5126, Vol. 146, no 51, p. 35146-35154Article in journal (Refereed) Published
Abstract [en]

Two-dimensional (2D) semiconducting dichalcogenides hold exceptional promise for next-generation electronic and photonic devices. Despite this potential, the pervasive presence of defects in 2D dichalcogenides results in carrier mobility and photoluminescence (PL) that fall significantly short of theoretical predictions. Although defect passivation offers a potential solution, its effects have been inconsistent. This arises from the lack of chemical understanding of the surface chemistry of the 2D material. In this work, we uncover new binding chemistry using a sequence-specific chemical passivation (SSCP) protocol based on 2-furanmethanothiol (FSH) and bis(trifluoromethane) sulfonimide lithium salt (Li-TFSI), which demonstrates a synchronized 100-fold enhancement in both carrier mobility and PL in WS2 monolayers. We propose an atomic-level synergistic defect passivation mechanism of both neutral and charged sulfur vacancies (SVs), supported by ultrafast transient absorption spectroscopy (TA), Hard X-ray photoelectron spectroscopy (HAXPES), and density functional theory (DFT) calculations. Our results establish a new semiconductor quality benchmark for 2D WS2, paving the way for the development of sustainable 2D semiconductor technologies.

Place, publisher, year, edition, pages
American Chemical Society (ACS), 2024
Keywords
2D transition metal dichalcogenides, chemical passivation, Defects, Monolayers, Passivation, Sulfur, X-ray photoelectron spectroscopy
National Category
Condensed Matter Physics
Research subject
Chemistry
Identifiers
urn:nbn:se:uu:diva-545242 (URN)10.1021/jacs.4c11052 (DOI)39662959 (PubMedID)2-s2.0-85212087650 (Scopus ID)
Funder
Swedish Research Council Formas, 2023-01607Swedish Research Council, 2018-06610Swedish Research Council, 2023-05244EU, European Research Council, 101002772EU, European Research Council, 758826Bertil & Britt Svenssons Stiftelse för Belysningsteknik, 2304ÅForsk (Ångpanneföreningen's Foundation for Research and Development), 22-390National Academic Infrastructure for Supercomputing in Sweden (NAISS), 2023/5-276Swedish Research Council, 2019-05591
Available from: 2024-12-13 Created: 2024-12-13 Last updated: 2025-10-14Bibliographically approved
Organisations
Identifiers
ORCID iD: ORCID iD iconorcid.org/0009-0008-6675-8603

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