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The integration of single-layer graphene with diamond substrates offers a promising platform for highperformance electronic devices by utilizing the exceptional properties of both materials. This study describes a fabrication process and transport measurements of single-layer graphene devices on diamond substrates featuring two surface terminations: hydrogen (H-terminated, thermal process) and oxygen (O-terminated, plasma treatment). The carrier transport properties were investigated using Hall effect measurements over a broad temperature range (80-400 K) under high-vacuum conditions (1 x 10^-4 mbar). Our findings reveal that thermal annealing significantly improves the graphene-diamond interface quality, causing a notable increase in carrier mobility for devices on both H- and O-terminated from 1439 to 1644 cm²/Vs and from 1238 to 1340 cm²/Vs, respectively. We also found that the effect of remote interfacial phonon scattering on high-temperature mobility is affected by the termination type. These findings highlight the importance of substrate surface engineering and offer a pathway for optimizing graphene-diamond heterostructures for advanced electronic applications.

The valley degree of freedom in many-valley semiconductors provides a new paradigm for storing and processing information in valleytronic and quantum-computing applications. Achieving practical devices requires all-electric control of long-lived valley-polarized states, without the use of strong external magnetic fields. Because of the extreme strength of the carbon–carbon bond, diamond possesses exceptionally stable valley states that provide a useful platform for valleytronic devices. Using ultrapure single-crystalline diamond, we demonstrate electrostatic control of valley currents in a dual-gate field-effect transistor, where the electrons are generated with a short ultraviolet pulse. The charge current and the valley current measured at the receiving electrodes are controlled separately by varying the gate voltages. We propose a model to interpret experimental data, based on drift-diffusion equations coupled through rate terms, with the rates computed by microscopic Monte Carlo simulations. As an application, we demonstrate valley-current charge-state modulation of nitrogen-vacancy centers.

A method based on the scaling properties of the Boltzmann transport equation is proposed to identify the dominant scattering mechanisms that affect charge transport in a semiconductor. This method uses drift velocity data of mobile charges at different lattice temperatures and applied electric fields and takes into account the effect of carrier heating. By performing time‐of‐flight measurements on single‐crystalline diamond, hole and electron drift velocities are measured under low‐injection conditions within the temperature range 10–300 K. Evaluation of the data using the proposed method identifies acoustic phonon scattering as the dominant scattering mechanism across the measured temperature range. The exception is electrons at 100–200 K where conduction‐band valley repopulation has a prominent effect. At temperatures below ≈80 K, where valley polarization is observed for electrons, transport dominated by acoustic phonon scattering is observed in different valleys separately. The scaling model is additionally tested on data from highly resistive gallium arsenide samples to demonstrate the versatility of the method. In this case, impurity scattering can be ruled out as the dominant scattering mechanism in the samples for the temperature range 80–120 K.

Full investigation of deep defect states and impurities in wide-bandgap materials by employing commercial transient capacitance spectroscopy is a challenge, demanding very high temperatures. Therefore, a high-temperature deep-level transient spectroscopy (HT-DLTS) system was developed for measurements up to 1100 K. The upper limit of the temperature range allows for the study of deep defects and trap centers in the bandgap, deeper than previously reported by DLTS characterization in any material. Performance of the system was tested by carrying out measurements on the well-known intrinsic defects in n-type 4H-SiC in the temperature range 300-950 K. Experimental observations performed on 4H-SiC Schottky diodes were in good agreement with the literature. However, the DLTS measurements were restricted by the operation and quality of the electrodes.

The transferred-electron oscillator (TEO), or Gunn oscillator, is a device used in microwave applications, which utilizes the negative differential mobility (NDM) effect to generate continuous oscillations. Recently, NDM was observed in intrinsic single-crystalline chemical vapor deposition (SC-CVD) diamond. The occurrence was explained by the electron repopulation between its different conduction band valleys. This paper presents the results of constructing a diamond TEO based on the NDM effect. A series of experiments have been performed for varying voltages, temperatures, and resonator parameters on three SC-CVD diamond samples of different thicknesses. For the temperature range of 90–300 K, we observe transferred-electron oscillations in diamond.

The recent discovery of Negative Differential Mobility (NDM) in intrinsic single-crystalline diamond enables the development of devices for high frequency applications. The Transferred-Electron Oscillator (TEO) is one example of such devices that uses the benefit of NDM to generate continuous oscillations. This paper presents theoretical investigations of a diamond TEO in the temperature range of 110 to 140K where NDM has been observed. Our simulations map out the parameter space in which transferred-electron oscillations are expected to occur for a specific device geometry. The results are promising and indicate that it is possible to fabricate diamond based TEO devices.

By performing Time-of-Flight measurements on high-purity single-crystalline chemical vapor deposited diamond, we are able to extract the electron drift velocity of valley-polarized electrons in the low-injection regime. The aim of this study is to improve the understanding of the mechanisms involved in the conduction-band transport of valley-polarized electrons. The measurements were carried out within the temperature range of 10-80 K, and the experimental results are systematically compared with Monte Carlo charge transport simulations. We observe a rapid enhancement of the electron mobility with decreasing temperature, which reveals that inelastic effects in electron-phonon scattering become important below similar to 40 K. In addition, we obtain the momentum relaxation rate for electrons with different valley polarizations.

We demonstrate that the highly stable valley-polarized electron states in ultrapure single-crystalline diamond allow for investigation of charge transport, magnetoresistivity, and determination of the dominant scattering mechanism. The Hall effect gives rise to nonisotropic contributions in the mobility tensor that were measured at a temperature of 70 K in a time-of-flight setup with an added magnetic field. The observations of the magnetotransport of valley-polarized electrons in diamond are compared with both Monte Carlo simulations and an analytical model based on the Boltzmann transport equation. We establish that acoustic phonon scattering is the dominant electron scattering mechanism at 70 K for each of the valley polarizations in the investigated samples.

Single-crystalline CVD diamond films have excellent electrical and material properties with potential in high power, high voltage and high frequency applications that are out of reach for conventional semiconductor materials. For realization of efficient devices (e.g. MOSFET), finding a suitable dielectric is essential to improve the reliability and electrical performance of devices. In the current study, we present results from surface passivation studies by high-k dielectric materials such as aluminum oxide and hafnium oxide deposited by ALD on intrinsic and boron doped diamond substrates. The hole transport properties in the intrinsic diamond films were evaluated and compared to unpassivated films using the lateral time-of-flight technique. The MOS capacitor structure, which forms the basic building block of the MOSFET, is discussed.

The recent progress in the growth of high-quality single-crystalline diamond films has sparked interest in the realization of efficient diamond power electronic devices. However, finding a suitable passivation is essential to improve the reliability and electrical performance of devices. In the current work, high-k dielectric materials such as aluminum oxide and hafnium oxide were deposited by atomic layer deposition on intrinsic diamond as a surface passivation layer. The hole transport properties in the diamond films were evaluated and compared to unpassivated films using the lateral time-of-flight technique. An enhancement of the near surface hole mobility in diamond films of up to 27% is observed when using aluminum oxide passivation.