GENL is a flexible program that can be used to simulate and/or fit x-ray diffraction data from epitaxial thin films exhibiting Laue oscillations. It utilizes differential evolution within a genetic algorithm for the fitting of data and is based on the kinematic theory of diffraction. Effects of polarization, absorption, the Lorentz factor, as well as instrumental resolution and vibrations are taken into account. Useful parameters that can be extracted after fitting include: atomic interplanar spacings, number of coherently scattering atomic planes, strain profiles along the film thickness, and crystal roughness. The program has been developed in MATLAB and employs a graphical user interface. The deployment strategy is twofold whereby the software can either be obtained in source code form and executed within the MATLAB environment, or as a pre-compiled binary for those who prefer not to run it within MATLAB. Finally, GENL can easily be extended to simulate multilayered film systems, superlattices, and films with atomic steps. The program is released under the GNU General Public Licence.
Title in dissertation list of papers:
GenL: an extensible fitting program for Laue oscillations and whole-pattern fitting
We report on the discovery of a boundary-induced body-centered tetragonal iron phase in thin films deposited on MgAl2O4 (001) substrates. We present evidence for this phase using detailed x-ray analysis and ab initio density functional theory calculations. A lower magnetic moment and a rotation of the easy magnetization direction are observed, as compared with body-centered cubic iron. Our findings expand the range of known crystal and magnetic phases of iron, providing valuable insights for the development of heterostructure devices using ultrathin iron layers.
We describe the effect of the Fe layer thickness on the antiferromagnetic interlayer exchange coupling in [Fe/MgO]𝑁 superlattices. An increase in coupling strength with increasing Fe layer thickness is observed, which highlights the need for including the extension of both layers when discussing the interlayer exchange coupling in superlattices.
The conditions whereby epitaxy is achieved are commonly believed to be mostly governed by misfit strain. We report on a systematic investigation of growth and interface structure of single crystalline tungsten thin films on two different metal oxide substrates, Al2O3 (11‾20) and MgO (001). We demonstrate that despite a significant mismatch, enhanced crystal quality is observed for tungsten grown on the sapphire substrates. This is promoted by stronger adhesion and chemical bonding with sapphire compared to magnesium oxide, along with the restructuring of the tungsten layers close to the interface. The latter is supported by ab initio calculations using density functional theory. Finally, we demonstrate the growth of magnetic heterostructures consisting of high-quality tungsten layers in combination with ferromagnetic CoFe layers, which are relevant for spintronic applications.
The work in this dissertation is devoted to investigating order and interfaces in epitaxial heterostructures. To achieve that the software tool box GenL was developed for simulating and fitting x-ray diffraction patterns from epitaxial thin films, which is used to access structural information on the length scales of interfaces and atomic bonds. Employing GenL, it is shown that a small lattice mismatch between substrate and epitaxial layer is not the sole origin of high crystal quality, as demonstrated for nearly strain-free epitaxial growth of tungsten on sapphire with a lattice mismatch of up to 19.4 %. Furthermore, it is discussed that electronic states at the substrate/film interface can have substantial significance for the crystal structure of an epitaxial layer. For instance, despite a nearly mismatch-free interface of body-centered cubic iron on spinel, the presence of a boundary-induced interface layer with tetragonally distorted crystal structure is discovered, which has a profound impact on the magnetic properties. Finally, when creating multilayered structures, not only the interface states but the total structure is found to influence the physical properties, which is demonstrated for the interlayer exchange coupling in [Fe/MgO]Nsuperlattices.
Note: This PhD thesis is partly based on the licentiate dissertation "Growth of high quality Fe thin films" by Anna L. Ravensburg, Uppsala University, 2022. Particularly parts of: Chapter 1, Sections 2.0, 2.1, 2.2, 3.0, 3.1, 3.2, 3.3, 5.1, and Fig. 2.6 are adapted from the licentiate thesis with minor edits and updates.
We investigate the growth of thin Fe layers on MgAl2O4 (001) and MgO (001) substrates using dc magnetron sputtering. The crystal quality of Fe layers deposited on MgAl2O4 is found to be substantially higher as compared to Fe grown on MgO substrates. The effects of the crystal quality on the magnetic and electric transport properties are discussed.
The HfV2-HfV2O7 composite is proposed as a material with potentially temperature-independent thermophysical properties due to the combination of anomalously increasing thermoelastic constants of HfV2 with the negative thermal expansion of HfV2O7. Based on literature data, the coexistence of both a near-zero temperature coefficient of elasticity and a coefficient of thermal expansion is suggested for a composite with a phase fraction of approximately 30 vol.% HfV2 and 70 vol.% HfV2O7. To produce HfV2-HfV2O7 composites, two synthesis pathways were investigated: (1) annealing of sputtered HfV2 films in air to form HfV2O7 oxide on the surface and (2) sputtering of HfV2O7/HfV2 bilayers. The high oxygen mobility in HfV2 is suggested to inhibit the formation of crystalline HfV2-HfV2O7 composites by annealing HfV2 in air due to oxygen-incorporation-induced amorphization of HfV2. Reducing the formation temperature of crystalline HfV2O7 from 550 degrees C, as obtained upon annealing, to 300 degrees C using reactive sputtering enables the synthesis of crystalline bilayered HfV2-HfV2O7.
We investigated the elastic properties of the HfV2O7 high-temperature phase, exhibiting negative thermal expansion, in a synergetic strategy of first-principle calculations and nanoindentation experiments performed on sputtered films. Self-consistent results were obtained for the measured elastic modulus (73 +/- 14 GPa) and dispersion-corrected density functional theory calculations. The elastic properties of HfV2O7 are affected by long-range dispersion interaction, which may be induced by severe modification in the second-nearest neighbor O-O bond distance as obtained upon compression. HfV2O7 is composed of HfO6, VO4, and V2O7 building blocks, whereby the latter is characterized by an increasing V-O(-V) bond length upon compression.
We have systematically studied the effect of transition metal valence electron concentration (VEC) of amorphous T0.75Y0.75B14 (a-T0.75Y0.75B14, T = Sc, Ti, V, Y, Zr, Nb) on the elastic properties, bonding, density and electronic structure using ab initio molecular dynamics. As the transition metal VEC is increased in both periods, the bulk modulus increases linearly with molar- and mass density. This trend can be understood by a concomitant decrease in cohesive energy. T' = Ti and Zr were selected to validate the predicted data experimentally. A-Ti0.74Y0.80B14 and a-Zr0.75Y0.75B14 thin films were synthesized by high power pulsed magnetron sputtering. Chemical composition analysis revealed the presence of up to 5 at.% impurities, with O being the largest fraction. The measured Young's modulus values for a-Ti0.74Y0.80B14 (301 +/- 8 GPa) and a-Zr0.75Y0.75B14 (306 +/- 9 GPa) are more than 20% smaller than the predicted ones. The influence of O incorporation on the elastic properties for these selected systems was theoretically studied, exemplarily in a-Ti0.75Y0.75B12.75O1.25. Based on ab initio data, we suggest that a-Ti0.75Y0.75B14 exhibits a very dense B network, which is partly severed in a-Ti0.75Y0.75B12.75O1.25. Upon O incorporation, the average coordination number of B and the molar density decrease by 9% and 8%, respectively. Based on these data the more than 20% reduced Young's modulus obtained experimentally for films containing impurities compared to the calculated Young's modulus for a-Ti0.75Y0.75B14 (without incorporated oxygen) can be rationalized. The presence of oxygen impurities disrupts the strong B network causing a concomitant decrease in molar density and Young's modulus. Very good agreement between the measured and calculated Young's modulus values is obtained if the presence of impurities is considered in the calculations. The implications of these findings are that prediction efforts regarding the elastic properties of amorphous borides containing oxygen impurities on the at.% level are flawed without taking the presence of impurities into account.