Open this publication in new window or tab >>2026 (English)In: Journal of applied crystallography, ISSN 0021-8898, E-ISSN 1600-5767, Vol. 59, no 3, p. 968-977Article in journal (Refereed) Published
Abstract [en]
GENL is a flexible program that can be used to simulate and/or fit x-ray diffraction data from epitaxial thin films exhibiting Laue oscillations. It utilizes differential evolution within a genetic algorithm for the fitting of data and is based on the kinematic theory of diffraction. Effects of polarization, absorption, the Lorentz factor, as well as instrumental resolution and vibrations are taken into account. Useful parameters that can be extracted after fitting include: atomic interplanar spacings, number of coherently scattering atomic planes, strain profiles along the film thickness, and crystal roughness. The program has been developed in MATLAB and employs a graphical user interface. The deployment strategy is twofold whereby the software can either be obtained in source code form and executed within the MATLAB environment, or as a pre-compiled binary for those who prefer not to run it within MATLAB. Finally, GENL can easily be extended to simulate multilayered film systems, superlattices, and films with atomic steps. The program is released under the GNU General Public Licence.
Place, publisher, year, edition, pages
International Union Of Crystallography, 2026
National Category
Condensed Matter Physics
Identifiers
urn:nbn:se:uu:diva-520681 (URN)10.1107/S1600576726002566 (DOI)001790366500025 ()42232126 (PubMedID)
Note
Title in dissertation list of papers:
GenL: an extensible fitting program for Laue oscillations and whole-pattern fitting
2024-01-142024-01-142026-06-30Bibliographically approved